Applied Physics A

, Volume 106, Issue 4, pp 767–772

Nanoimprint lithography with ≤60 nm overlay precision

  • Wei Wu
  • Robert G. Walmsley
  • Wen-Di Li
  • Xuema Li
  • R. Stanley Williams
Invited paper

DOI: 10.1007/s00339-012-6775-z

Cite this article as:
Wu, W., Walmsley, R.G., Li, WD. et al. Appl. Phys. A (2012) 106: 767. doi:10.1007/s00339-012-6775-z

Abstract

Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.

Copyright information

© Springer-Verlag 2012

Authors and Affiliations

  • Wei Wu
    • 1
  • Robert G. Walmsley
    • 1
  • Wen-Di Li
    • 1
  • Xuema Li
    • 1
  • R. Stanley Williams
    • 1
  1. 1.HP LabsHewlett-Packard Co.Palo AltoUSA

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