Applied Physics A

, Volume 106, Issue 4, pp 767–772 | Cite as

Nanoimprint lithography with ≤60 nm overlay precision

  • Wei Wu
  • Robert G. Walmsley
  • Wen-Di Li
  • Xuema Li
  • R. Stanley Williams
Invited paper

Abstract

Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.

References

  1. 1.
    S.Y. Chou, P.R. Krauss, P.J. Renstrom, J. Vac. Sci. Technol. B 14(6), 4129–4133 (1996) CrossRefGoogle Scholar
  2. 2.
    W. Wu, W.M. Tong, J. Bartman, Y.F. Chen, R. Walmsley, Z.N. Yu, Q.F. Xia, I. Park, C. Picciotto, J. Gao, S.Y. Wang, D. Morecroft, J. Yang, K.K. Berggren, R.S. Williams, Nano Lett. 8(11), 3865–3869 (2008) ADSCrossRefGoogle Scholar
  3. 3.
    Z.M. Ye, R. Ramos, C. Brooks, L. Simpson, J. Fretwell, S. Carden, P. Hellebrekers, D. LaBrake, D.J. Resnick, S.V. Sreenivasan, in Alternative Lithographic Technologies III, ed. by D.J.C. Herr. SPIE Proc., vol. 7970 (SPIE Press, Bellingham, 2011) Google Scholar
  4. 4.
    L. Singh, K. Luo, Z.M. Ye, F. Xu, G. Haase, D. Curran, D. LaBrake, D. Resnick, S.V. Sreenivasan, in Alternative Lithographic Technologies III, ed. by D.J.C. Herr. SPIE Proc., vol. 7970 (SPIE Press, Bellingham, 2011) Google Scholar
  5. 5.
    M. Malloy, L.C. Litt, Proc. SPIE 7637, 763706 (2010) CrossRefGoogle Scholar
  6. 6.
    W. Wu, G.-Y. Jung, D.L. Olynick, J. Straznicky, Z. Li, X. Li, D.A.A. Ohlberg, Y. Chen, S.-Y. Wang, J.A. Liddle, W.M. Tong, R.S. Williams, Appl. Phys. A 80(6), 1173–1178 (2005) CrossRefGoogle Scholar
  7. 7.
    M.D. Austin, H.X. Ge, W. Wu, M.T. Li, Z.N. Yu, D. Wasserman, S.A. Lyon, S.Y. Chou, Appl. Phys. Lett. 84(26), 5299–5301 (2004) ADSCrossRefGoogle Scholar
  8. 8.
    S.R.J. Brueck, S.H. Zaidi, U.S. Patent, 5,216,257, 1993 Google Scholar
  9. 9.
    M. Mühlberger, I. Bergmair, W. Schwinger, M. Gmainer, R. Schöftner, T. Glinsner, C. Hasenfuß, K. Hingerl, M. Vogler, H. Schmidt, E.B. Kley, Microelectron. Eng. 84(5–8), 925–927 (2007) CrossRefGoogle Scholar
  10. 10.
    N.H. Li, W. Wu, S.Y. Chou, Nano Lett. 6(11), 2626–2629 (2006) ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2012

Authors and Affiliations

  • Wei Wu
    • 1
  • Robert G. Walmsley
    • 1
  • Wen-Di Li
    • 1
  • Xuema Li
    • 1
  • R. Stanley Williams
    • 1
  1. 1.HP LabsHewlett-Packard Co.Palo AltoUSA

Personalised recommendations