Nanoimprint lithography with ≤60 nm overlay precision
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- Wu, W., Walmsley, R.G., Li, WD. et al. Appl. Phys. A (2012) 106: 767. doi:10.1007/s00339-012-6775-z
Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm.