Applied Physics A

, 105:69

Evolution of hole depth and shape in ultrashort pulse deep drilling in silicon

Article

Abstract

We report on the temporal evolution of the percussion drilling process in deep laser drilling. Ultrashort laser pulses at 1030 nm and a duration of 8 ps were used to machine silicon while simultaneously imaging the silhouette of the hole using an illumination wavelength above the band edge. We investigate the influence of the processing parameters fluence and pulse energy on the depth and shape of the hole demonstrating different phases of the drilling process. In the first phase, a tapered hole is formed with highly reproducible shape and depth. In the following, the evolution of the hole shape is irregular and imperfections like bulges, changes of the drilling direction and the formation of multiple hole ends occur. In the final phase, the maximum depth stays constant while the volume still increases due to enlargement of the hole diameter and the possible formation of multiple hole ends. Deviations from the ideal hole shape occur primarily in the lower part of the hole. Their extent can be reduced by increasing the amount of applied pulse energy. Moreover, the pulse energy is chiefly determining the maximum achievable hole depth, which is largely independent of the focusing conditions and corresponding fluence.

References

  1. 1.
    D. Breitling, A. Ruf, F. Dausinger, Proc. SPIE 5339, 49 (2004) ADSCrossRefGoogle Scholar
  2. 2.
    S. Preuss, A. Demchuk, M. Stuke, Appl. Phys. A 61, 33 (1995) ADSCrossRefGoogle Scholar
  3. 3.
    B.N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, A. Tünnermann, Appl. Phys. A 63, 109 (1996) ADSCrossRefGoogle Scholar
  4. 4.
    S. Nolte, C. Momma, H. Jacobs, A. Tünnermann, B.N. Chichkov, B. Wellegehausen, H. Welling, J. Opt. Soc. Am. B 14, 2716 (1997) ADSCrossRefGoogle Scholar
  5. 5.
    S. Amoruso, B. Toftmann, J. Schou, R. Velotta, X. Wang, Thin Solid Films 453–454, 562 (2004) CrossRefGoogle Scholar
  6. 6.
    J. König, S. Nolte, A. Tünnermann, Opt. Express 13, 10597 (2005) CrossRefGoogle Scholar
  7. 7.
    S. Amoruso, R. Bruzzese, C. Pagano, X. Wang, Appl. Phys. A 89, 1017 (2007) ADSCrossRefGoogle Scholar
  8. 8.
    A. Ancona, S. Döring, C. Jauregui, F. Röser, J. Limpert, S. Nolte, A. Tünnermann, Opt. Lett. 34, 3304 (2009) ADSCrossRefGoogle Scholar
  9. 9.
    S. Bruneau, J. Hermann, G. Dumitru, M. Sentis, E. Axente, Appl. Surf. Sci. 248, 299 (2005) ADSCrossRefGoogle Scholar
  10. 10.
    A. Michalowski, D. Walter, F. Dausinger, T. Graf, J. Laser Micro/Nanoeng. 3, 211 (2008) CrossRefGoogle Scholar
  11. 11.
    P.J.L. Webster, M.S. Muller, J.M. Fraser, Opt. Express 15, 14967 (2007) ADSCrossRefGoogle Scholar
  12. 12.
    P.J.L. Webster, J.X.Z. Yu, B.Y.C. Leung, M.D. Anderson, V.X.D. Yang, J.M. Fraser, Opt. Lett. 35, 646 (2010) CrossRefGoogle Scholar
  13. 13.
    T. Abeln, J. Radtke, F. Dausinger, Proc. ICALEO 88, 195 (1999) Google Scholar
  14. 14.
    T.V. Kononenko, V.I. Konov, S.V. Garnov, S.M. Klimentov, F. Dausinger, Laser Phys. 11, 343 (2001) Google Scholar
  15. 15.
    S. Döring, S. Richter, S. Nolte, A. Tünnermann, Opt. Express 18, 20395 (2010) CrossRefGoogle Scholar
  16. 16.
    E. Coyne, J. Magee, P. Mannion, G. O’Connor, Proc. SPIE 4876, 487 (2003) CrossRefGoogle Scholar
  17. 17.
    J.M. Liu, Opt. Lett. 7, 196 (1982) ADSCrossRefGoogle Scholar
  18. 18.
    A. Ruf, P. Berger, F. Dausinger, H. Hügel, J. Phys. D 34, 2918 (2001) ADSCrossRefGoogle Scholar
  19. 19.
    F. Dausinger, F. Lichtner, H. Lubatschowski, Femtosecond Technology for Technical and Medical Applications (Springer, Berlin/Heidelberg, 2004) CrossRefGoogle Scholar
  20. 20.
    C.S. Nielsen, P. Balling, J. Appl. Phys. 99, 093101 (2006) ADSCrossRefGoogle Scholar
  21. 21.
    A.E. Wynne, B.C. Stuart, Appl. Phys. A 76, 373 (2003) ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2011

Authors and Affiliations

  • S. Döring
    • 1
  • S. Richter
    • 1
  • A. Tünnermann
    • 1
    • 2
  • S. Nolte
    • 1
    • 2
  1. 1.Institute of Applied PhysicsFriedrich-Schiller-UniversityJenaGermany
  2. 2.Fraunhofer Institute for Applied Optics and Precision EngineeringJenaGermany

Personalised recommendations