Sub-wavelength micromachining of silica glass by irradiation of CO2 laser with Fresnel diffraction

Abstract

We investigated a simple and productive micromachining method of silica glass by ablation using a TEA CO2 laser (10.6 μm) with a spatial resolution down to sub-wavelength scale. The silica glass was irradiated by the TEA CO2 laser light through a copper grid mask with square apertures of 20×20 μm2 attached to the silica glass surface. After the irradiation, circular holes with a diameter of several μm were formed on the silica glass surface at the centers of the apertures due to the Fresnel diffraction effect. The minimum diameter of the holes was 3.4 μm. The characteristics of the micromachining are discussed based on the electric field distributions of the CO2 laser light under the mask using a three-dimensional full-wave electromagnetic field simulation.

This is a preview of subscription content, access via your institution.

References

  1. 1.

    R. Martinez Vazquez, R. Osellame, M. Cretich, M. Chiari, C. Dongre, H.J.W.M. Hoekstra, M. Pollnau, H. van den Vlekkert, R. Ramponi, G. Cerullo, Anal. Bioanal. Chem. 393, 1209 (2009)

    Article  Google Scholar 

  2. 2.

    F. He, Y. Cheng, Z. Xu, Y. Liao, J. Xu, H. Sun, C. Wang, Z. Zhou, K. Sugioka, K. Midorikawa, Y. Xu, X. Chen, Opt. Lett. 35, 282 (2010)

    ADS  Article  Google Scholar 

  3. 3.

    S. Nikumb, Q. Chen, C. Li, H. Reshef, H.Y. Zheng, H. Qiu, D. Low, Thin Solid Films 477, 216 (2005)

    ADS  Article  Google Scholar 

  4. 4.

    H. Niino, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, Appl. Surf. Sci. 253, 8287 (2007)

    ADS  Article  Google Scholar 

  5. 5.

    T. Sato, R. Kurosaki, A. Narazaki, Y. Kawaguchi, H. Niino, Appl. Phys. A (2010). doi:10.1007/s00339-010-5790-1

  6. 6.

    T. Makimura, S. Mitani, Y. Kenmotsu, K. Murakami, Appl. Phys. Lett. 85, 1274 (2004)

    ADS  Article  Google Scholar 

  7. 7.

    T. Makimura, H. Miyamoto, Y. Kenmotsu, K. Murakami, Appl. Phys. Lett. 86, 103111 (2005)

    ADS  Article  Google Scholar 

  8. 8.

    V.K. Sysoev, V.I. Masychev, B.P. Papchenko, S.Ya. Rusanov, A.A. Yakovlev, N.P. Glukhoedov, Inorg. Mater. 39, 532 (2003)

    Article  Google Scholar 

  9. 9.

    L.Ç. Özcan, V. Tréanton, R. Kashyap, L. Martinu, IEEE Photonics Technol. Lett. 19, 459 (2007)

    ADS  Article  Google Scholar 

  10. 10.

    D. Yuan, S. Das, J. Appl. Phys. 101, 024901 (2007)

    ADS  Article  Google Scholar 

  11. 11.

    H. Qi, T. Chen, L. Yao, T. Zuo, Opt. Lasers Eng. 47, 594 (2009)

    Article  Google Scholar 

  12. 12.

    H. Qi, X. Wang, T. Chen, X. Ma, T. Zuo, Microsyst. Technol. 15, 1027 (2009)

    Article  Google Scholar 

  13. 13.

    H. Klank, J.P. Kutter, O. Geschke, Lab. Chip 2, 242 (2002)

    Article  Google Scholar 

  14. 14.

    R. Braun, R. Nowak, P. Hess, H. Oetzmann, C. Schmidt, Appl. Surf. Sci. 43, 352 (1989)

    ADS  Article  Google Scholar 

  15. 15.

    P.E. Dyer, J. Mackay, C.D. Walton, Opt. Commun. 240, 391 (2004)

    ADS  Article  Google Scholar 

  16. 16.

    K. Ke, E.F. Hasselbrink, A.J. Hunt, Anal. Chem. 77, 5083 (2005)

    Article  Google Scholar 

Download references

Author information

Affiliations

Authors

Corresponding author

Correspondence to K. Okazaki.

Rights and permissions

Reprints and Permissions

About this article

Cite this article

Okazaki, K., Torii, S., Makimura, T. et al. Sub-wavelength micromachining of silica glass by irradiation of CO2 laser with Fresnel diffraction. Appl. Phys. A 104, 593–599 (2011). https://doi.org/10.1007/s00339-011-6364-6

Download citation

Keywords

  • Silica Glass
  • Aperture Size
  • Optical Microscope Image
  • Ablate Surface
  • Fresnel Diffraction