Intrinsic resistive switching and memory effects in silicon oxide
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Resistive switching behaviors are described in silicon oxide (SiOx) systems employing vertical E/SiOx/E (E denotes the electrode) structures. The switching is largely independent of the electrode material and attributed to the intrinsic properties of SiOx. Based on the recent experimental observation (Yao et al. in Nano Lett. 10:4105, 2010) of a silicon filament embedded in the SiOx matrix, we further discuss the switching mechanism in light of the measured electrical phenomena. The set voltages are largely SiOx-thickness independent, consistent with the mechanistic picture of point switching in the silicon filament. The multi-state switching and shifts in the set voltages with respect to the reset voltages are consistent with an electrochemical redox process (Si ↔ SiOy) at the switching site.
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