Applied Physics A

, Volume 102, Issue 3, pp 605–610 | Cite as

Annealing of gold nanostructures sputtered on glass substrate

  • V. Švorčík
  • J. Siegel
  • P. Šutta
  • J. Mistrík
  • P. Janíček
  • P. Worsch
  • Z. Kolská


The effects of annealing at 300 °C on gold nanostructures sputtered onto glass substrate were studied using XRD, SAXSees, the Van der Pauw method and ellipsometry. As-sputtered and annealed samples exhibit a different dependence of the gold lattice parameter on the sputtering time. With increasing sputtering time the average thickness of the layer and the size of gold crystallites increased. Another rapid enlargement of the crystallites is observed after annealing. The volume resistivity decreases rapidly with the increasing sputtering time for both, as-deposited and annealed structures. With increasing sputtering time initially discontinuous gold coverage changes gradually in a continuous one. Electrically continuous gold coverage on the as-sputtered and annealed samples exhibits the same concentration of free charge carriers and Hall mobility. Optical constants of as-deposited and annealed gold films determined by ellipsometry support resistivity measurements and clearly manifest the presence of plasmons in discontinuous films.


Annealed Sample Gold Layer Hall Mobility Free Charge Carrier Free Carrier Concentration 


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Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  • V. Švorčík
    • 1
  • J. Siegel
    • 1
  • P. Šutta
    • 2
  • J. Mistrík
    • 3
  • P. Janíček
    • 3
  • P. Worsch
    • 4
  • Z. Kolská
    • 5
  1. 1.Department of Solid State EngineeringInstitute of Chemical TechnologyPragueCzech Republic
  2. 2.New Technologies-Research Centre in Westbohemian RegionUniversity of West BohemiaPlzenCzech Republic
  3. 3.Department of Applied Physics and MathematicsUniversity of PardubicePardubiceCzech Republic
  4. 4.Anton Paar GmbHGrazAustria
  5. 5.Department of ChemistryJ.E. Purkyně UniversityUsti nad LabemCzech Republic

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