Electron beam nanofabrication of ferromagnetic nanostructures in TEM
- 141 Downloads
Electron beam (e-beam) fabrication of nanostructures by transmission electron microscopy (TEM) is rapidly developing into a top-down nanofabrication method for the sub-5 nm fabrication of structures that cannot usually be realised using resist based lithographic techniques or by the focused ion beam patterning methods. We describe the usage of a variety of e-beam shapes, including point and elliptical line focus, as well as a comparison of LaB6 and field-emission guns (FEGs), to achieve versatile sculpting of nanodot arrays, nanobridges and nanotips. We operate our patterning on free-standing nickel (Ni) thin film laterally connected to a silicon (Si) substrate as well as to free-standing Ni nanotips, where we achieve a novel three-dimensional (3D) nano-sculpting methodology.
KeywordsHole Drilling Astigmatism Hole Array Transmission Electron Microscopy Specimen Line Focus
Unable to display preview. Download preview PDF.
- 16.G. Möbus, R.E. Dunin-Burkowski, C.J.D. Hetherington, J.L. Hutchison, Microsc. Microanal. 7(S2), 344 (2001) Google Scholar
- 19.X. Xu, Z. Saghi, G. Yang, Y. Peng, B.J. Inkson, R. Gay, G. Möbus, MRS Symposia Proceedings (Materials Research Society, Pittsburgh, 2007), No. 928E, p. 0982-KK02-04 Google Scholar
- 23.Z.Z. Bandic, E.A. Dobisz, T.-W. Wu, T.R. Albrecht, Solid State Technol. 49, 9 (2006) Google Scholar