Applied Physics A

, 98:171 | Cite as

Three-dimensional SiO2 surface structures fabricated using femtosecond laser lithography

  • Mizue Mizoshiri
  • Hiroaki Nishiyama
  • Junji Nishii
  • Yoshinori Hirata
Article

Abstract

We report the fabrication of three-dimensional (3-D) SiO2 surfaces using femtosecond-laser lithography-assisted micromachining, which is a combined process of nonlinear lithography and plasma etching. Using pattern transfer of photoresist structures written by femtosecond laser-induced nonlinear absorption, SiO2-based Fresnel lens arrays with 3-D surfaces were obtained for this study. Using the open-aperture z-scan method, the femtosecond laser two-photon absorption coefficient of the KMPR resist was estimated as 17–23 cm/TW, assuming that single-photon absorption was negligible. By adding O2 to the etching gas (CHF3) during pattern transfer, the surface roughness of the transferred structures was reduced to RMS 16.90 nm, which corresponds to one quarter of that without adding O2. When 632.8-nm-wavelength light was coupled to the lenses with 3-D surfaces, the focal length was measured as 2790 μm, which agreed well with the theoretical value.

PACS

85.40.Hp 85.85.+j 81.16.Nd 42.62.Cf 42.82.Cr 

References

  1. 1.
    S. Maruo, O. Nakamura, S. Kawata, Opt. Lett. 22, 132 (1997) CrossRefADSGoogle Scholar
  2. 2.
    S. Kawata, H.-B. Sun, T. Tanaka, K. Takada, Nature 412, 697 (2001) CrossRefADSGoogle Scholar
  3. 3.
    J. Serbin, A. Egbert, A. Ostendorf, B.N. Chichkov, R. Houbertz, G. Domann, J. Schulz, C. Cronauer, L. Fröhlich, M. Popall, Opt. Lett. 28, 301 (2003) CrossRefADSGoogle Scholar
  4. 4.
    H.-B. Sun, V. Mizeikis, Y. Xu, S. Juodkazis, J.-Y. Ye, S. Matsuo, H. Misawa, Appl. Phys. Lett. 79, 1 (2001) CrossRefADSGoogle Scholar
  5. 5.
    T.W. Lim, Y. Son, D.-Y. Yang, H.-J. Kong, K.-S. Lee, S.H. Park, Appl. Phys. A 92, 541 (2008) CrossRefADSGoogle Scholar
  6. 6.
    R. Guo, A. Xiao, X. Zhai, J. Li, A. Xia, W. Huang, Opt. Express 14, 811 (2006) ADSGoogle Scholar
  7. 7.
    Q.-D. Chen, D. Wu, L.-G. Niu, J. Wang, X.-F. Lin, H. Xia, H.-B. Sun, Appl. Phys. Lett. 91, 171105 (2007) CrossRefADSGoogle Scholar
  8. 8.
    S. Maruo, H. Inoue, Appl. Phys. Lett. 89, 144101 (2006) CrossRefADSGoogle Scholar
  9. 9.
    F. Formanek, N. Takeyasu, T. Tanaka, K. Chiyoda, A. Ishikawa, S. Kawata, Opt. Express 14, 800 (2006) CrossRefADSGoogle Scholar
  10. 10.
    N. Takeyasu, T. Tanaka, S. Kawata, Appl. Phys. A 90, 205 (2008) CrossRefADSGoogle Scholar
  11. 11.
    S.A. Rinne, F. Garcia-Santamaria, P.V. Braun, Nature Photon. 2, 52 (2008) CrossRefADSGoogle Scholar
  12. 12.
    H. Nishiyama, M. Mizoshiri, T. Kawahara, J. Nishii, Y. Hirata, Opt. Express 16, 17288 (2008) CrossRefADSGoogle Scholar
  13. 13.
    M. Mizoshiri, H. Nishiyama, T. Kawahara, J. Nishii, Y. Hirata, Appl. Phys. Express 1, 127001 (2008) CrossRefADSGoogle Scholar
  14. 14.
    W. Däschener, P. Long, R. Stein, C. Wu, S.H. Lee, Opt. Express 36, 4675 (1997) Google Scholar
  15. 15.
    T.J. Suleski, D.C. O’Shea, Opt. Express 34, 7507 (1995) Google Scholar
  16. 16.
    C.T. Pan, J. Micromech. Microeng. 14, 417 (2004) Google Scholar
  17. 17.
    J.W. Sung, H. Hockel, J.D. Brown, E.G. Johnson, Appl. Opt. 45, 33 (2006) CrossRefADSGoogle Scholar
  18. 18.
    C.M. Waits, A. Modafe, R. Ghodssi, J. Micromech. Microeng. 13, 170 (2003) CrossRefADSGoogle Scholar
  19. 19.
    Y. Hirai, Y. Inamoto, K. Sugano, T. Tsuchiya, O. Tabata, J. Micromech. Microeng. 17, 199 (2007) CrossRefADSGoogle Scholar
  20. 20.
    K. Totsu, K. Fujishiro, S. Tanaka, M. Esashi, Sens. Actuators A 130–131, 387 (2006) CrossRefGoogle Scholar
  21. 21.
    M. Sheik-Bahae, A. Said, T. Wei, D.J. Hagan, E.W. Van Strayland, IEEE J. Quantum Electron. 26, 760 (1990) CrossRefADSGoogle Scholar
  22. 22.
    Z.R. Chowdhury, R. Fedosejevs, Microsyst. Technol. 14, 59 (2007) CrossRefGoogle Scholar
  23. 23.
    D.A. Buralli, G.M. Morris, J.R. Rogers, Appl. Opt. 28, 976 (1989) CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag 2009

Authors and Affiliations

  • Mizue Mizoshiri
    • 1
  • Hiroaki Nishiyama
    • 1
  • Junji Nishii
    • 2
  • Yoshinori Hirata
    • 1
  1. 1.Division of Materials and Manufacturing Science, Graduate School of EngineeringOsaka UniversitySuitaJapan
  2. 2.Research Institute for Electronic ScienceHokkaido UniversitySapporoJapan

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