Electromechanical properties of lanthanum-doped lead hafnate titanate thin films for integrated piezoelectric MEMS applications
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Abstract
This paper focuses on the deposition and electromechanical characterization of lanthanum-doped lead hafnate titanate (PLHT) thin films as key material in piezoelectric microelectromechanical systems (pMEMS). PLHT (x/30/70) and PLHT(x/45/55) films with a thickness between 150 nm and 250 nm were deposited by chemical solution deposition (CSD). Thereby x varies between 0 and 10% La content. The electrical characterization shows that undoped (x=0) PLHT exhibit ferroelectric behavior similar to PZT of the same composition. La doping results in reduced ferroelectric properties and also affects the electromechanical properties. Measurements using a double beam laser interferometer yield a piezoelectric coefficient d 33 of 60 pm/V, which stays constant with an increasing electric field. This leads to a linear displacement compared to undoped PLHT or conventional PZT films used for MEMS applications.
PACS
77 77.22.Ej 77.65.-j 77.65.Bn 77.84.-sPreview
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References
- 1.D.L. Polla, L.F. Francis, MRS Bull. 21, 59–65 (1996) Google Scholar
- 2.P. Muralt, M. Kohli, T. Maeder, A. Kholkin, K. Brooks, N. Setter, R. Luthier, Sens. Actuators A 48, 157–165 (1995) CrossRefGoogle Scholar
- 3.P. Muralt, A. Kholkin, M. Kohli, T. Maeder, K.G. Brooks, R. Luthier, Integr. Ferroelectr. 11, 213–220 (1995) CrossRefGoogle Scholar
- 4.M.-A. Dubois, P. Muralt, IEEE Trans. Ultrason. Ferroelectr. Freq. Control 45, 1169–1177 (1998) CrossRefGoogle Scholar
- 5.W.P. Robbins, Integr. Ferroelectr. 11, 179–190 (1995) CrossRefGoogle Scholar
- 6.D.L. Polla, SPIE 2046, 24–27 (1997) CrossRefGoogle Scholar
- 7.M. Arik, S.M. Zurn, A. Bar-Cohen, Y. Nam, D. Markus, D. Polla, in Proc. of Int. Conf. on Modelling and Simulation of Microsystems, Semiconductors, Sensors and Actuators (1999), pp. 651–654 Google Scholar
- 8.Y. Nemirovsky, A. Nemirovsky, P. Muralt, N. Setter, Sens. Actuators A 56, 239–249 (1996) CrossRefGoogle Scholar
- 9.N. Ledermann, J. Baborowski, A. Seifert, B. Willing, S. Hiboux, P. Muralt, N. Setter, M. Forster, Integr. Ferroelectr. 35, 177–184 (2001) CrossRefGoogle Scholar
- 10.K.M. Johnson, J. Appl. Phys. 33, 2826 (1962) CrossRefADSGoogle Scholar
- 11.L.M. Sheppard, Ceram. Bull. 71, 85 (1992) Google Scholar
- 12.F. De Flaviis, N.G. Alexpopoulos, M. Staffsud, IEEE Trans. Microwave Theory Tech. 45, 963–969 (1997) CrossRefGoogle Scholar
- 13.P. Padmini, T.R. Taylor, M.J. Lefevre, A.S. Nagra, R.A. York, J.S. Speck, Appl. Phys. Lett. 75, 3186–3188 (1999) CrossRefGoogle Scholar
- 14.S. Tappe, U. Böttger, R. Waser, Integr. Ferroelectr. 53, 455–464 (2003) Google Scholar
- 15.C. Kügeler, A. Hennings, U. Böttger, R. Waser, J. Electroceram. (online) (2008). doi: 10.1007/s10832-008-9457-7 Google Scholar
- 16.J. Frantti, Y. Fujioka, S. Ericsson, S. Hull, M. Kakihana, Inorg. Chem. 44, 9267–9278 (2005) CrossRefGoogle Scholar
- 17.C. Muller, J.-L. Baudour, V. Madigou, F. Bouree, J.-M. Kiat, C. Favotto, M. Roubin, Acta Cryst. B 55, 8–16 (1999) CrossRefGoogle Scholar
- 18.C. Muller, J.-L. Baudour, C. Bedoya, F. Bouree, J.-L. Soubeyroux, M. Roubin, Acta Cryst. B 56, 27–38 (2000) CrossRefGoogle Scholar
- 19.C. Bedoya, C. Muller, J.-L. Baudour, F. Bouree, J.-L. Soubeyroux, M. Roubin, J. Phys. Condens. Matter 13, 6453–6470 (2001) CrossRefADSGoogle Scholar
- 20.J. Frantti, Y. Fujioka, S. Ericsson, S. Lantto, M. Kakihana, J. Electroceram. 13, 299–303 (2004) CrossRefGoogle Scholar
- 21.G. Fantozzi, H. Idrissi, C. Favotto, M. Roubin, J. Eur. Ceram. Soc. 20, 1671–1676 (2000) CrossRefGoogle Scholar
- 22.C. Heremans, H.L. Tuller, J. Europ. Ceram. Soc. 19, 1133–1137 (1999) CrossRefGoogle Scholar
- 23.P.J. Schorn, T. Schneller, U. Böttger, R. Waser, J. Am. Ceram. Soc. 88, 1312–1314 (2005) CrossRefGoogle Scholar
- 24.R.W. Schwarz, T. Schneller, R. Waser, C. R., Chim. 7, 433–461 (2004) Google Scholar
- 25.T. Schneller, R. Waser, J. Sol-Gel Sci. Technol. 42, 337–352 (2007) CrossRefGoogle Scholar
- 26.P. Gerber, A. Roelofs, O. Lohse, C. Kügeler, S. Tiedke, U. Böttger, R. Waser, Rev. Sci. Instrum. 74, 2613–2615 (2003) CrossRefADSGoogle Scholar
- 27.C. Bedoya, C. Muller, A. Kowalski, E. Nigrelli, J.-Y. Leblais, M. Roubin, J. Mater. Sci.: Mater. Electron. 12, 543–550 (2001) CrossRefGoogle Scholar
- 28.T. Schneller, H. Kohlstedt, A. Petraru, R. Waser, J. Guo, J. Denlinger, T. Learmonth, P.-A. Glans, K.E. Smith, J. Sol-Gel Sci. Technol. 48, 239–252 (2008) CrossRefGoogle Scholar
- 29.S.-Y. Chen, I.-W. Chen, J. Am. Ceram. Soc. 77, 2332–2336 (1994) CrossRefGoogle Scholar
- 30.K.G. Brooks, I.M. Reaney, R. Klissurska, Y. Huang, L. Bursill, N. Setter, J. Mater. Res. 9, 2540–2553 (1994) CrossRefADSGoogle Scholar
- 31.P. Gerber, U. Böttger, R. Waser, J. Appl. Phys. 100, 124105 (2006) CrossRefADSGoogle Scholar