Applied Physics A

, Volume 93, Issue 1, pp 69–73 | Cite as

Submicrometer grating fabrication in fused silica by interferometric laser-induced backside wet etching technique

  • Csaba Vass
  • Károly Osvay
  • Tamás Véső
  • Béla Hopp
  • Zsolt Bor
Article

Abstract

Submicrometer period fused silica gratings were produced by two-beam interferometric laser-induced backside wet etching technique (TWIN LIBWE). The fourth harmonic of a Nd:YAG laser beam was spatially filtered in two steps, and the smoothened beam was split into two parts and interfered at incident angles of 60°, 30°, 14°, and 7.7°, respectively, on the backsides of fused silica plates that were in contact with a liquid absorber. The periods of the produced fused silica gratings were, respectively, 154 nm, 266 nm, 550 nm, and 990 nm. In the next step, TWIN-LIBWE setup was completed by using a coupling rectangular prism in order to reach immersion setup, which made possible to fabricate 104 nm period fused silica grating. This is the smallest laser-generated grating constant in fused silica at present.

The morphology of the etched gratings was characterized by atomic force microscope. Important parameters (modulation depth, low-pass filtered waviness, quality factor) of the produced gratings were determined. Evolution of the grating parameters was also studied in the 990 nm case: the dependence of modulation depth, waviness, and quality factor on the number of laser pulses was investigated.

PACS

42.62 42.79 81.65 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    J. Wang, H. Niino, A. Yabe, Appl. Phys. A 68, 111 (1999) CrossRefADSGoogle Scholar
  2. 2.
    H. Niino, Y. Kawaguchi, T. Sato, A. Narazaki, T. Gumpenberger, R. Kurosaki, Appl. Surf. Sci. 252, 4387 (2006) CrossRefADSGoogle Scholar
  3. 3.
    R. Böhme, A. Braun, K. Zimmer, Appl. Surf. Sci. 186, 276 (2002) CrossRefGoogle Scholar
  4. 4.
    G. Kopitkovas, T. Lippert, C. David, A. Wokaun, J. Gobrecht, Microelectron. Eng. 67–68, 438 (2003) CrossRefGoogle Scholar
  5. 5.
    C. Vass, T. Smausz, B. Hopp, J. Phys. D Appl. Phys. 37, 2449 (2004) CrossRefADSGoogle Scholar
  6. 6.
    C. Vass, K. Osvay, M. Csete, B. Hopp, Appl. Surf. Sci. 253, 8059 (2007) CrossRefADSGoogle Scholar
  7. 7.
    C. Vass, K. Osvay, B. Hopp, Opt. Express 14, 8354 (2006) CrossRefADSGoogle Scholar
  8. 8.
    C. Vass, K. Osvay, B. Hopp, Z. Bor, Appl. Phys. A 87, 611 (2007) CrossRefADSGoogle Scholar
  9. 9.
    D. Bäuerle, Laser Processing and Chemistry, 3rd edn. (Springer, Berlin, 2000) Google Scholar
  10. 10.
    D.L. Sedin, K.L. Rowlen, Appl. Surf. Sci. 182, 40 (2001) CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag 2008

Authors and Affiliations

  • Csaba Vass
    • 1
  • Károly Osvay
    • 1
  • Tamás Véső
    • 1
  • Béla Hopp
    • 2
  • Zsolt Bor
    • 1
  1. 1.Department of Optics and Quantum ElectronicsUniversity of SzegedSzegedHungary
  2. 2.Research Group on Laser Physics of the Hungarian Academy of SciencesSzegedHungary

Personalised recommendations