Applied Physics A

, 92:749

Material processing of dielectrics with temporally asymmetric shaped femtosecond laser pulses on the nanometer scale

  • L. Englert
  • M. Wollenhaupt
  • L. Haag
  • C. Sarpe-Tudoran
  • B. Rethfeld
  • T. Baumert
Article

DOI: 10.1007/s00339-008-4584-1

Cite this article as:
Englert, L., Wollenhaupt, M., Haag, L. et al. Appl. Phys. A (2008) 92: 749. doi:10.1007/s00339-008-4584-1

Abstract

Laser material processing of dielectrics with temporally asymmetric femtosecond laser pulses of identical fluence, spectrum, and statistical pulse duration is investigated experimentally. To that end single shot structures at the surface of fused silica as a function of fluence and pulse shape are analyzed with the help of scanning electron microscopy. Structures for the bandwidth limited pulses show the known expansion in structure size with increasing laser fluence approaching the diffraction limit, which is 1.4 μm for the 0.5NA microscope objective used. In contrast, structures from the asymmetric pulses are remarkably stable with respect to variations in laser fluence and stay below 300 nm despite doubling the fluence. Different thresholds for surface material modification with respect to an asymmetric pulse and its time reversed counterpart are attributed to control of different ionization processes.

PACS

78.47.-p 81.16.-c 42.62.-b 

Copyright information

© Springer-Verlag Berlin Heidelberg 2008

Authors and Affiliations

  • L. Englert
    • 1
  • M. Wollenhaupt
    • 1
  • L. Haag
    • 1
  • C. Sarpe-Tudoran
    • 1
  • B. Rethfeld
    • 2
  • T. Baumert
    • 1
  1. 1.Institut fuer Physik und CINSaTUniversitaet KasselKasselGermany
  2. 2.Fachbereich PhysikTechnische Universitaet KaiserslauternKaiserslauternGermany

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