Towards the implanting of ions and positioning of nanoparticles with nm spatial resolution
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Decreasing structure sizes in both conventional and quantum solid state devices require novel fabrication methods: we present a technology which allows to implant ions through a small hole in the tip of an atomic force microscope. This technique offers a maskless addressing of small structures using different projectiles at kinetic energies between 0.5 and 5.0 keV. Our method aims to implant single atomic ions, molecular ions or charged nanoparticles with nm resolution. We test the method by implanting N+ ions into diamond and generating nitrogen-vacancy color centers. The system is operated with a conventional ion gun. However, in future we will employ an ion trap as a deterministic source of cold single ions.
KeywordsAtomic Force Microscope Atomic Force Microscope System Atomic Force Microscope Operation Nanoparticle Beam Atomic Force Microscope Device
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