Applied Physics A

, Volume 90, Issue 2, pp 317–321

Luminescence mechanism of ZnO thin film investigated by XPS measurement


DOI: 10.1007/s00339-007-4275-3

Cite this article as:
Hsieh, PT., Chen, YC., Kao, KS. et al. Appl. Phys. A (2008) 90: 317. doi:10.1007/s00339-007-4275-3


The effects of annealing environment on the luminescence characteristics of ZnO thin films that were deposited on SiO2/Si substrates by reactive RF magnetron sputtering were investigated by X-ray photoelectron spectroscopy (XPS) and photoluminescence (PL). An analysis of the O 1s peak of ZnO film revealed that the concentration of oxygen vacancies increased with the annealing temperature from 600 °C to 900 °C under an ambient atmosphere. The PL results demonstrated that the intensity of green light emission at 523 nm also increased with temperature. Under various annealing atmospheres, the analyses of PL indicated that only one emission peak (523 nm) was obtained, indicating that only one class of defect was responsible for the green luminescence. The green light emission was strongest and the concentration of oxygen vacancies was highest when the ZnO film was annealed in ambient atmosphere at 900 °C. The results in this investigation show that the luminescence mechanism of the emission of green light from a ZnO thin film is associated primarily with oxygen vacancies.

Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • P.-T. Hsieh
    • 1
  • Y.-C. Chen
    • 1
  • K.-S. Kao
    • 2
  • C.-M. Wang
    • 3
  1. 1.Department of Electrical EngineeringNational Sun Yat-Sen UniversityKaohsiungR.O.C.
  2. 2.Department of Computer and CommunicationShu-Te UniversityKaohsiungR.O.C.
  3. 3.Department of Electrical EngineeringCheng Shiu UniversityKaohsiungR.O.C.

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