Applied Physics A

, Volume 83, Issue 3, pp 361–363 | Cite as

Vertical nanopatterning of 6H-SiC(0001) surfaces using gold-metal nanotube membrane lithography

  • W. Lee
  • E. Moyen
  • W. Wulfhekel
  • A. Leycuras
  • K. Nielsch
  • U. Gösele
  • M. Hanbücken


Large-area membranes consisting of arrays of gold metal nanotubes were used as shadow masks to generate vertical nanopatterned 6H-SiC(0001) substrates. The gold membranes are formed by a replication technique based on electrochemical deposition of anodic aluminium oxide membranes or silicon substrates containing lithographically generated etch pits. Using the gold metal membranes as masks in reactive ion etching, spatially well-resolved protrusions in the SiC substrate were etched, arranged in periodic and non-periodic two-dimensional arrays. Final vertical morphological reorganizations were obtained in a hot-wall reactor under hydrogen flow. The obtained large-area networks of nano-objects have many potential applications in magnetism, electronics and biology.


Photonic Crystal Shadow Mask Anodic Aluminum Oxide Membrane Gallium Phosphide Nanoporous Anodic Aluminum 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    J.S. Lee, N.-H. Cho, Appl. Surf. Sci. 190, 171 (2002)CrossRefADSGoogle Scholar
  2. 2.
    J.C. Hulteen, C.R. Martin, J. Mater. Chem. 7, 1075 (1997)CrossRefGoogle Scholar
  3. 3.
    G. Sauer, G. Brehm, S. Schneider, K. Nielsch, R.B. Wehrspohn, J. Choi, H. Hofmeister, U. Gösele, J. Appl. Phys. 91, 3243 (2002)CrossRefADSGoogle Scholar
  4. 4.
    I.M. Tiginyanu, C. Schwab, J.-J. Grob, B. Prévot, H.L. Hartnagel, A. Vogt, G. Irmer, J. Monecke, Appl. Phys. Lett. 71, 3829 (1997)CrossRefADSGoogle Scholar
  5. 5.
    A.J. Rosenbloom, D.M. Sipe, Y. Shishkin, Y. Ke, R.P. Devaty, W.J. Choyke, Biomed. Microdev. 6, 261 (2004)CrossRefGoogle Scholar
  6. 6.
    T. Matsumoto, J. Takahashi, T. Tamaki, T. Futagi, H. Mimura, Y. Kanemitsu, Appl. Phys. Lett. 64, 226 (1994)CrossRefADSGoogle Scholar
  7. 7.
    H. Mimura, T. Matsumoto, Y. Kanemitsu, Appl. Phys. Lett. 64, 3350 (1994)CrossRefADSGoogle Scholar
  8. 8.
    A. Sagar, C.D. Lee, R.M. Feenstra, C.K. Inoki, T.S. Kuan, J. Appl. Phys. 92, 4070 (2002)CrossRefADSGoogle Scholar
  9. 9.
    Y. Shishkin, Y. Ke, R.P. Devaty, W.J. Choyke, J. Appl. Phys. 97, 044908 (2005)CrossRefADSGoogle Scholar
  10. 10.
    W. Wulfhekel, D. Sander, S. Nitsche, A. Leycuras, M. Hanbücken, Appl. Phys. A 79, 411 (2004)CrossRefADSGoogle Scholar
  11. 11.
    D. Sander, W. Wulfhekel, M. Hanbücken, S. Nitsche, J.-P. Palmari, F. Dulot, F. Arnaud d’Avitaya, A. Leycuras, Appl. Phys. Lett. 81, 3579 (2002)CrossRefADSGoogle Scholar
  12. 12.
    S. Matthias, F. Müller, C. Jamois, R.B. Wehrspohn, U. Gösele, Adv. Mater. 16, 2166 (2004)CrossRefGoogle Scholar
  13. 13.
    V. Lehmann, H. Föll, J. Electrochem. Soc. 137, 653 (1990)CrossRefGoogle Scholar
  14. 14.
    V. Lehmann, J. Electrochem. Soc. 140, 2836 (1993)CrossRefGoogle Scholar
  15. 15.
    K. Nielsch, J. Choi, K. Schwirn, R.B. Wehrspohn, U. Gösele, Nano Lett. 2, 677 (2002)CrossRefADSGoogle Scholar
  16. 16.
    SiCrystal AG, Erlangen, Germany, www.sicrystal.deGoogle Scholar
  17. 17.
    W. Lee, M. Alexe, K. Nielsch, U. Gösele, Chem. Mater. 17, 3325 (2005)CrossRefGoogle Scholar
  18. 18.
    J. Choi, K. Nielsch, M. Reiche, R.B. Wehrspohn, U. Gösele, J. Vac. Sci. Technol. B 21, 763 (2003)CrossRefGoogle Scholar
  19. 19.
    A. Leycuras, Mater. Sci. Forum 338342, 241 (2000)CrossRefGoogle Scholar
  20. 20.
    W. Wulfhekel, D. Sander, S. Nitsche, F. Dulot, A. Leycuras, M. Hanbücken, Surf. Sci. 550, 8 (2004)CrossRefADSGoogle Scholar
  21. 21.
    V. Ramachandran, M.F. Brady, A.R. Smith, R.M. Feenstra, J. Electron. Mater. 27, 308 (1998)CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag 2006

Authors and Affiliations

  • W. Lee
    • 1
  • E. Moyen
    • 2
  • W. Wulfhekel
    • 1
  • A. Leycuras
    • 3
  • K. Nielsch
    • 1
  • U. Gösele
    • 1
  • M. Hanbücken
    • 2
  1. 1.Max Planck Institute of Microstructure PhysicsHalleGermany
  2. 2.CRMCN-CNRSCampus de LuminyMarseilleFrance
  3. 3.CRHEA-CNRSValbonneFrance

Personalised recommendations