Applied Physics A

, Volume 81, Issue 3, pp 481–486 | Cite as

Nanostructure fabrication by glancing angle ion beam assisted deposition of silicon

Article

Abstract

Glancing angle deposition by utilizing an ion beam sputter process and a controlled substrate rotation is used to deposit silicon nanostructures with different structure varieties. The structures are grown on seeded and plain [100] silicon substrates at room temperature. The ratio of deposition rate to substrate angular frequency and the substrate surface properties determine the nanostructure geometry, size and assembly.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    O. Toader, S. John: Science 292, 1133 (2001)ADSCrossRefGoogle Scholar
  2. 2.
    S.R. Kennedy, M.J. Brett, O. Toader, S. John: Nanoletters 2, 59 (2002)ADSCrossRefGoogle Scholar
  3. 3.
    S.R. Kennedy, M.J. Brett: J. Vac. Sci. Technol. B 22(3), 1184 (2004)CrossRefGoogle Scholar
  4. 4.
    K.D. Harris, D. Vick, E.J. Gonzales, T. Smy, K. Robbie, M.J. Brett: Surf. Coat. Technol. 138, 185 (2001)ADSCrossRefGoogle Scholar
  5. 5.
    K. Robbie, D.J. Broer, M.J. Brett: Nature 399, 764 (1999)ADSCrossRefGoogle Scholar
  6. 6.
    F. Tang, D.-L. Liu, D.-X. Ye, Y.-P. Zhao, T.-M. Lu, A. Vijayaraghavan: J. Appl. Phys. 93, 4193 (2003)ADSGoogle Scholar
  7. 7.
    B. Dick, M.J. Brett, T.J. Smy, M.R. Freeman, M. Malac, R.F. Egerton: J. Vac. Sci. Technol. A 18, 1838 (2000)ADSCrossRefGoogle Scholar
  8. 8.
    K. Robbie, M.J. Brett, A. Lakhtakia: J. Vac. Sci. Technol. A 13, 2991 (1995)ADSCrossRefGoogle Scholar
  9. 9.
    B. Dick, M.J. Brett, T. Smy: J. Vac. Sci. Technol. B 21, 2569 (2003)CrossRefGoogle Scholar
  10. 10.
    K. Robbie, G. Beydaghyan, T. Brown, C. Dean, J. Adams, C. Buzea: Rev. Sci. Instrum. 74, 1089 (2004)ADSCrossRefGoogle Scholar
  11. 11.
    M. Malac, R.F. Egerton: J. Vac. Sci. Technol. A 19, 158 (2001)ADSCrossRefGoogle Scholar
  12. 12.
    B. Dick, M.J. Brett, T. Smy, M. Belov, M.R. Freeman: J. Vac. Sci. Technol. B 19, 1813 (2001)CrossRefGoogle Scholar
  13. 13.
    J.C. Sit, D. Vick, K. Robbie, M.J. Brett: J. Mater. Res. 14, 1197 (1999)ADSCrossRefGoogle Scholar
  14. 14.
    B. Dick, M.J. Brett, T. Smy: J. Vac. Sci. Technol. B 21, 23 (2003)CrossRefGoogle Scholar
  15. 15.
    T. Karabacak, G.-C. Wang, T.-M. Lu: J. Vac. Sci. Technol. A 22, 1778 (2004)ADSCrossRefGoogle Scholar
  16. 16.
    R. Messier, T. Gehrke, C. Frankel, V.C. Venugopal, W. Otaño, A. Lakhtakia: J. Vac. Sci. Technol. A 15, 2148 (1997)ADSCrossRefGoogle Scholar
  17. 17.
    T. Karabacak, G.-C. Wang, T.-M. Lu: J. Appl. Phys. 94, 7723 (2003)ADSCrossRefGoogle Scholar
  18. 18.
    T. Karabacak, J.P. Singh, Y.-P. Zhao, G.-C. Wang, T.-M. Lu: Phys. Rev. B 68, 123408 (2003)CrossRefGoogle Scholar
  19. 19.
    T. Smy, S.K. Dew, R.V. Joshi: J. Vac. Sci. Technol. A 19, 251 (2001)ADSCrossRefGoogle Scholar
  20. 20.
    T. Smy, D. Walkey, K.D. Harris, M.J. Brett: Thin Solid Films 391, 88 (2001)ADSCrossRefGoogle Scholar
  21. 21.
    T. Smy, D. Vick, M.J. Brett, S.K. Dew, A.T. Wu, J.C. Sit, K.D. Harris: J. Vac. Sci. Technol. A 18, 2507 (2000)ADSCrossRefGoogle Scholar
  22. 22.
    M. Zeuner, F. Scholze, B. Dathe, H. Neumann: Surf. Coat. Technol. 142144, 39 (2001)Google Scholar
  23. 23.
    R.N. Tait, T. Smy, M.J. Brett: J. Vac. Sci. Technol. A 10, 1518 (1992)ADSCrossRefGoogle Scholar
  24. 24.
    W. Eckstein: Computer Simulation of Ion–Solid Interactions (Springer Ser. Mater. Sci. 10) (Springer, Berlin 1991)Google Scholar

Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  • E. Schubert
    • 1
  • T. Höche
    • 1
  • F. Frost
    • 1
  • B. Rauschenbach
    • 1
  1. 1.Leibniz-Institut für Oberflächenmodifizierung e.V.LeipzigGermany

Personalised recommendations