Applied Physics A

, Volume 79, Issue 8, pp 1839–1842 | Cite as

Diffusion-limited photopolymerization in scanning micro-stereolithography

  • N. Fang
  • C. Sun
  • X. ZhangEmail author
Rapid communication


The trade-off between process speed and resolution in microstereolithography (μSL) roots on the diffusion-limited kinetics of photopolymerization. Using a numerical model, we have investigated the influence of diffusion dominant effect under high photon flux. Radical depletion turned out to limit the smallest feature achievable to the order of 10 μm under high process speed. A solution of pulsed laser curing is proposed in order to realize sub-micron resolution in high speed μSL process.


Pulse Laser Numerical Model Process Speed Photon Flux Dominant Effect 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


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Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  1. 1.Department of Mechanical and Aerospace EngineeringUniversity of California-Los Angeles Los AngelesUSA

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