Lithographical laser ablation using femtosecond laser
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Lithographical laser ablation was demonstrated using a femtosecond laser with a lithographical optical system. In this method, a femtosecond laser beam passes through a mask and the pattern is imaged on a film by a coherent optical system. As a result, the film is lithographically ablated, and a micron-sized pattern can be generated in a single shot. The resolution of generation was 13 μm, and the narrowest width of a generated line was about 4 μm. Moreover, the system was applied to transmission gratings as masks, and nano-sized periodic structures such as nano-sized hole matrices and nano-meshes were generated in a single shot.
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