Applied Physics A

, Volume 79, Issue 4–6, pp 1199–1201 | Cite as

Pulsed laser deposition of atomically flat La1-xSrxMnO3 thin films using a novel target geometry

  • P.R. Willmott
  • R. Herger
  • M.C. Falub
  • L. Patthey
  • M. Döbeli
  • C.V. Falub
  • M. Shi
  • M. Schneider
Article

Abstract

A new ablation target geometry is presented that was used to produce thin films of La1-xSrxMnO3 grown heteroepitaxially on SrTiO3 by pulsed reactive crossed-beam laser ablation. The films were grown in order to perform angle-resolved photoelectron spectroscopy, which demands that the surface be atomically flat. In situ and ex situ analysis shows that this condition was met, even after depositing to a thickness of over 100 nm.

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Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  • P.R. Willmott
    • 1
    • 2
  • R. Herger
    • 1
    • 2
  • M.C. Falub
    • 1
  • L. Patthey
    • 1
  • M. Döbeli
    • 3
  • C.V. Falub
    • 4
  • M. Shi
    • 1
  • M. Schneider
    • 5
  1. 1.Swiss Light SourcePaul Scherrer InstituteVilligenSwitzerland
  2. 2.Physical Chemistry InstituteUniversity of ZürichZürichSwitzerland
  3. 3.ETH HönggerbergPaul Scherrer InstituteZürichSwitzerland
  4. 4.Laboratory for Micro- and NanotechnologyPaul Scherrer InstituteVilligenSwitzerland
  5. 5.Laboratory for Neutron ScatteringPaul Scherrer InstituteVilligenSwitzerland

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