Table-top 50-W laser system for ultra-fast laser ablation
- 194 Downloads
We have built a mode-locked Nd:YVO4 laser with a very long resonator which produces an average power of 50 W in 13-ps pulses at 1064 nm and was designed for applications in micro-machining, the deposition of optical thin films, and the growth of nano-clusters in the laser-ablated plumes. By operating the laser at very low mode-locking repetition rates (1.5 MHz, 2.6 MHz, and 4.1 MHz), high pulse power is available in a near diffraction limited beam, allowing focused intensities to exceed 1012 W/cm2 and permitting efficient evaporation of difficult materials such as Si. The high power also allows conversion into the second harmonic at 532 nm with an efficiency exceeding 80%. Measurements of the ablation mass in experiments with metals show a 30–100 times increase in the ablation rate compared to the conventional low-repetition-rate ns-range lasers.
Unable to display preview. Download preview PDF.
- 7.D. Bäuerle: Laser Processing and Chemistry (Springer, Berlin 2000) and references thereinGoogle Scholar
- 8.D.B. Chrisey, G.K. Hubler: Pulsed Laser Deposition of Thin Films (Wiley, New York 1994) and references thereinGoogle Scholar
- 13.M. Hashida, A.F. Semerok, O. Gobert, G. Petite, Y. Izawa, J.F. Wagner: Appl. Surf. Sci. 197–198, 862 (2002)Google Scholar
- 15.Y. Hirayama, M. Obara: Appl. Surf. Sci. 197–198, 741 (2002)Google Scholar
- 17.E.G. Gamaly, A.V. Rode, V.Z. Kolev, N.R. Madsen, M. Duering, J. Giesekus, B. Luther-Davies: ‘High-repetition-rate Laser–Solid Interaction: Cumulative Ablation’, COLA’03 (Crete, Greece, 5–10 October 2003)Google Scholar