Advertisement

OR Spectrum

, Volume 30, Issue 3, pp 431–452 | Cite as

Heuristic algorithms to solve the capacity allocation problem in photolithography area (CAPPA)

  • Shu-Hsing ChungEmail author
  • Chun-Ying Huang
  • Amy H. I. Lee
Regular Article

Abstract

Wafer fabrication is one of the most complex and high competence manufacturing. How to fully utilize the machine capacity to meet customer demand is a very important topic. In this paper, we address the capacity allocation problem for photolithography area (CAPPA), which belongs to a capacity requirement planning scheme, with the process window and machine dedication restrictions that arise from an advanced wafer fabrication technology environment. Process window means that a wafer needs to be processed on machines that can satisfy its process capability (process specification). Machine dedication means that once the first critical layer of a wafer lot is processed on a certain machine, the subsequent critical layers of this lot must be processed on the same machine to ensure good quality of final products. We present six modified heuristics and a linear-programming-based heuristic algorithm (LPBHA) to solve the problem efficiently. The performance of the proposed algorithms is tested using real-world CAPPA cases taken from wafer fabrication photolithography area. Computational results show that LPBHA is the most effective one, and with a least average and a least standard deviation of deviation ratio of 0.294 and 0.085% compared to the lower bound of the CAPPA.

Keywords

Photolithography area Process window Machine dedication Heuristic Linear programming 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. Akçalı E, Nemoto K, Uzsoy R (2001) Cycle-time improvements for photolithography process in semiconductor manufacturing. IEEE Trans Semicond Manuf 14(1):48–56CrossRefGoogle Scholar
  2. Akçalı E, Uzsoy R (2000) A sequential solution methodology for capacity allocation and lot scheduling problems for photolithography. In: 2000 IEEE/CPMT International Symposium on Electronics Manufacturing Technology, pp 374–381Google Scholar
  3. Chen JC, Chen CW, Lin CJ, Rau H (2005) Capacity planning with capability for multiple semiconductor manufacturing fabs. Comput Indust Eng 48(4):709–732CrossRefGoogle Scholar
  4. Chou YC, Hong IH (2000) A methodology for product mix semiconductor foundry manufacturing. IEEE Trans Semicond Manuf 13(3):278–285CrossRefGoogle Scholar
  5. Chung SH, Huang CY, Lee AHI (2006) Capacity allocation model for photolithography workstation with the constraints of process window and machine dedication. Prod Plan Control 17(7):678–688CrossRefGoogle Scholar
  6. Chung SH, Huang HW (2001) Loading allocation algorithm with machine capability restriction for wafer fabrication factories. J Chin Inst Ind Eng 18(4):82–96Google Scholar
  7. Hung YF, Cheng GJ (2002) Hybrid capacity modeling for alternative machine types in linear programming production planning. IIE Trans 34(2):157–165Google Scholar
  8. ILOG Inc. (2001) ILOG OPL Studio 3.5. ILOG Inc., FranceGoogle Scholar
  9. Leachman RC, Carmon TF (1992) On capacity modeling for production planning with alternative machine types. IIE Trans 24(4):62–72CrossRefGoogle Scholar
  10. Low CP, Fang C (2005) On the load-balanced demand points assignment problem in large-scale wireless LANs. Lect Notes Comput Sci 3391:21–30CrossRefGoogle Scholar
  11. Sule DR (1997) Industrial scheduling. PWS Publishing Company, Boston, pp 124–126Google Scholar
  12. Toktay LB, Uzsoy R (1998) A capacity allocation problem with integer side constraints. Eur J Operat Res 109(1):170–182CrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • Shu-Hsing Chung
    • 1
    Email author
  • Chun-Ying Huang
    • 2
  • Amy H. I. Lee
    • 3
  1. 1.Department of Industrial Engineering and ManagementNational Chiao Tung UniversityHsinchuTaiwan, ROC
  2. 2.Department of Business AdministrationChing Yun UniversityJungliTaiwan, ROC
  3. 3.Department of Industrial Engineering and System ManagementChung Hua UniversityHsinchuTaiwan, ROC

Personalised recommendations