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Polymer Bulletin

, Volume 72, Issue 3, pp 523–533 | Cite as

Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist

  • Jingcheng Liu
  • Xiangfei Zheng
  • Hu Li
  • Ren Liu
  • Qidao Mu
  • Xiaoya LiuEmail author
Original Paper

Abstract

A series of novel branched methacrylate copolymers (BPMBMV) were synthesized via the mercapto chain transfer polymerization using methacrylic acid, maleic anhydride, benzyl methacrylate, and 4-vinyl benzyl thiol. Then, BPMBMV reacted with hydroxyethyl acrylate to obtain branched UV-curable copolymer H-BPMBMV, which were characterized by fourier transfer infrared spectra and proton nuclear magnetic resonance spectra. The molecular weights and glass transition temperature (T g ) of the polymers decreased with the addition of VBT. The results of photo-differential scanning calorimetry (Photo-DSC) tests showed that photo-polymerization ability of H-BPMBMV increased with the increased content of VBT. With an optimized formulation, a negative-type photoresist was prepared. The resolution of the circuit could reach as high as 20 μm, and the film of photoresist showed good acid resistance.

Keywords

Branched copolymer UV curable Photoresist Resolution 

Notes

Acknowledgments

We acknowledge financial support from the National Nature Science Foundation of Jiangsu Province (No. BK20140160) and Suzhou Rui Hong Electronic Chemicals Co., Ltd.

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Copyright information

© Springer-Verlag Berlin Heidelberg 2014

Authors and Affiliations

  • Jingcheng Liu
    • 1
    • 2
  • Xiangfei Zheng
    • 1
    • 2
  • Hu Li
    • 1
    • 2
  • Ren Liu
    • 1
    • 2
  • Qidao Mu
    • 3
  • Xiaoya Liu
    • 1
    • 2
    Email author
  1. 1.The Key Laboratory of Food Colloids and BiotechnologyMinistry of EducationWuxiChina
  2. 2.School of Chemical and Material EngineeringJiangnan UniversityWuxiChina
  3. 3.Suzhou Rui Hong Electronic Chemicals Co., Ltd.,SuzhouChina

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