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Analytical and Bioanalytical Chemistry

, Volume 404, Issue 2, pp 479–487 | Cite as

Chemical interactions in the layered system BC x N y /Ni(Cu)/Si, produced by CVD at high temperature

  • P. S. HoffmannEmail author
  • M. I. Kosinova
  • S. Flege
  • O. Baake
  • B. Pollakowski
  • V. A. Trunova
  • A. Klein
  • B. Beckhoff
  • F. A. Kuznetsov
  • W. Ensinger
Original Paper

Abstract

Layered samples Si(100)/C/Ni/BC x N y and Si(100)/C/Cu/BC x N y were produced by physical vapor deposition of a metal (Ni, Cu, resp.) and low-pressure chemical vapor deposition of the boron carbonitride on a Si(100) substrate. Between the Si and the Ni (Cu) and on the surface of the Ni (Cu) layer, thin carbon layers were deposited, as a diffusion barrier or as a protection against oxidation, respectively. Afterwards, the surface carbon layer was removed. As precursor, trimethylamine borane and, as an auxiliary gas, H2 and NH3 were used, respectively. The chemical compositions of the layers and of the interfaces in between were characterized by total-reflection X-ray fluorescence spectrometry combined with near-edge X-ray absorption fine-structure spectroscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry. The application of H2 yielded the BC x N y compound whereas the use of NH3 led to a mixture of h-BN and graphitic carbon. At the BC x N y /metal interface, metal borides could be identified. At the relatively high synthesis temperature of 700 °C, broad regions of Cu or Ni and Si were observed between the metal layer and the substrate Si.

Keywords

Boron carbonitride/metal/silicon-layered system Interfaces Near-edge X-ray absorption fine-structure spectroscopy X-ray photoelectron spectroscopy Secondary ion mass spectroscopy 

Notes

Acknowledgments

The authors are grateful for the financial support by Deutsche Forschungsgemeinschaft (DFG), grants EN 207/25-1 and BE 1372/6-1, and Russian Fond Fundamental Research (RFFI), grant 10-03-91332.

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Copyright information

© Springer-Verlag 2012

Authors and Affiliations

  • P. S. Hoffmann
    • 1
    Email author
  • M. I. Kosinova
    • 2
  • S. Flege
    • 1
  • O. Baake
    • 1
  • B. Pollakowski
    • 3
  • V. A. Trunova
    • 2
  • A. Klein
    • 1
  • B. Beckhoff
    • 3
  • F. A. Kuznetsov
    • 2
  • W. Ensinger
    • 1
  1. 1.Department of Materials ScienceTechnische Universität DarmstadtDarmstadtGermany
  2. 2.Nikolaev Institute of Inorganic Chemistry SB RASNovosibirskRussia
  3. 3.Physikalisch-Technische BundesanstaltBerlinGermany

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