Analytical and Bioanalytical Chemistry

, Volume 389, Issue 3, pp 763–767 | Cite as

A simple method for measuring plasma power in rf-GDOES instruments

  • T. Nelis
  • M. Aeberhard
  • L. Rohr
  • J. Michler
  • P. Belenguer
  • P. Guillot
  • L. Thérèse
Technical Note

Abstract

A method for determining plasma power in rf-GDOES is presented. It is based on an effective resistance located in the inductive coil of the impedance matching. The amount of electrical power consumed in the matching system depends on the capacitive current flowing through the matching system, which depends on the applied voltage, the stray capacity, and the frequency. This correction method is experimentally evaluated and compared with the integral plasma power calculation.

Keywords

rf-GDOES rf-Power control Blind power 

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Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • T. Nelis
    • 1
  • M. Aeberhard
    • 1
  • L. Rohr
    • 1
  • J. Michler
    • 1
  • P. Belenguer
    • 2
  • P. Guillot
    • 3
  • L. Thérèse
    • 3
  1. 1.EMPA Materials Science and TechnologyThunSwitzerland
  2. 2.Laplace, UMR 5213Université Paul SabatierToulouse cedexFrance
  3. 3.Université Jean François ChampollionAlbi cedexFrance

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