Analytical and Bioanalytical Chemistry

, Volume 381, Issue 1, pp 173–188 | Cite as

Glow discharge mass spectrometry

  • Volker Hoffmann
  • Martin Kasik
  • Peter K. Robinson
  • Cornel Venzago


Over the past twenty years or so, glow discharge mass spectrometry (GDMS) has become the industry standard for the analysis of trace elements in metals and semiconductors. A review of its history is followed by a picture of the present situation and a look to where the future may lie. Applications are summarised, including the ability of GDMS to offer depth-resolved data and non-conductor analysis, and the well-documented quantitative nature of the results is reviewed. The effects resulting from the physical properties of the analyte material are discussed at length. Finally, recent work such as “fast flow” sources and pulsed glow discharges is reviewed.


Glow discharge mass spectrometry Depth profile Temperature Fast flow Pulse 


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Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  • Volker Hoffmann
    • 1
  • Martin Kasik
    • 2
  • Peter K. Robinson
    • 3
  • Cornel Venzago
    • 4
  1. 1.Leibniz Institute for Solid State and Materials Research DresdenDresdenGermany
  2. 2.Shiva Technologies, Inc.SyracuseUSA
  3. 3.Mass Spectrometry InternationalAltrinchamUK
  4. 4.degussa, AQura GmbHHanauGermany

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