Abstract
The aim of this work is to find how substrate bias affect the microstructure, mechanical, and tribological properties of the a-C/H films deposited on Ti6Al4V by magnetron sputtering. In order to attain this purpose, the structure of the deposited a-C/H film was investigated by scanning electron microscopy. Chemical bonding was examined by Raman spectroscopy techniques. Mechanical and tribological properties were evaluated using nanoindentation, scratch, internal stress, and ball-on-disk friction testing. The results showed that the sp2 content in a-C/H films increased as the bias voltage increased from − 400 to − 1200 V, indicating the graphitization of the films. The hardness (H) decreased from 29 to 18 GPa and the adhesion strength ranged from 13.1 to 25.3 N with increasing bias substrate. The average friction coefficient decreased at a bias voltage of − 300 V and increased when the bias voltage increased to − 1200 V. The best tribological performance was reached at − 600 V bias voltage. Reasons for the changing of structures, mechanical and tribological properties of a-C/H films were proposed.
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Huang, W., Ma, J., Wang, J. et al. Microstructure, mechanical, and tribological properties of hydrogenated amorphous carbon film deposited on Ti6Al4V alloy under different substrate bias voltage. Int J Adv Manuf Technol 94, 2491–2497 (2018). https://doi.org/10.1007/s00170-017-0947-0
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DOI: https://doi.org/10.1007/s00170-017-0947-0