Deterministic fabrication of nanostructures for plasmonic lens by focused ion beam
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Plasmonic lens is a key component in the development of sub-wavelength resolution optical system for bio-imaging and nanolithography applications. In order to develop a deterministic fabrication capability for nanostructures on plasmonic lens by using focused ion beam, this paper presents a highly robust and accurate surface topography model based on level set method. Sputtered atom distribution and angular dependence of sputter yield are calculated by Monte Carlo simulation programs SRIM/TRIM and TRIDYN, respectively. Redeposition effect is included in the physical model and successfully embedded into a topography simulation program by applying the level set method. The proposed model is validated and evaluated in the focused ion beam fabrication experiments. Simulation error of less than 7% is obtained. Two types of nanostructures for plasmonic lens were fabricated using the machining parameters approved by this simulation model. Simulation errors of 7 and 2 nm were found in a nanodots array and a spiral Bragg grating, respectively. The results clearly demonstrate the effectiveness of the modelling approach developed for deterministic fabrication of nanostructures.
KeywordsFocused ion beam Nanostructures Plasmonic lens Level set method Surface topography
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