Prevention of hydrogen degradation in titanium by deposition of TiN thin film
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This paper describes the effects of using a TiN film as a possible protection layer for titanium in an aggressive chemical environment. The TiN film as a barrier of hydrogen permeation into the material was evaluated by electrochemical cathodic charging of the specimens in solutions with different pH values and temperatures. Results revealed that the thickness of hydride on the surface of the uncoated titanium increased with the increase of charging time. Higher charging temperature and lower pH value promoted the formation of hydride phases. For titanium coated with a TiN film, it effectively retarded the permeation of hydrogen into the titanium substrate. However, this was at the sacrifice of the TiN film itself.
Keywordscathodic charging hydrogen degradation plasma nitriding TiN thin film titanium
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