Inorganic Materials

, Volume 36, Issue 5, pp 454–457 | Cite as

Chemical vapor deposition of refractory metals from fluoride gases

  • Yu. V. Lakhotkin
  • V. P. Kuz’min
  • T. I. Rybkina
  • A. B. Kovalev
Article

Abstract

The kinetics of the chemical vapor deposition of Group V (V, Nb, Ta), VI (Mo, W), and VII (Re) transition metals from fluoride-hydrogen mixtures were studied. The major steps of the deposition process were established. The deposition rate is shown to correlate with the thermodynamic probability of hydrogen reduction. The effect of intermediate products on the deposition rate of 3d and 4d transition metals is assessed.

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Copyright information

© MAIK “Nauka/Interperiodica” 2000

Authors and Affiliations

  • Yu. V. Lakhotkin
    • 1
  • V. P. Kuz’min
    • 1
  • T. I. Rybkina
    • 1
  • A. B. Kovalev
    • 1
  1. 1.Institute of Physical ChemistryRussian Academy of SciencesMoscowRussia

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