Copper-related deep acceptor in heat-treated Ge1-xSix single crystals
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Abstract
Hall measurements demonstrate that Cu-doped Ge1-xSix (0 ≤x ≤ 0.15) single crystals quenched after heat treatment at 700–720°C contain a new deep acceptor. The ionization energy of this acceptor is linear in silicon content, EDA (x) = 0.08 + 0.63x eV. Annealing the Ge1-xSix crystals at 260–270°C leads to the disappearance of the deep acceptors and an equivalent increase in the concentration of shallow acceptors related to substitutional copper. The deep acceptor consists most likely of a substitutional copper atom and a mobile defect, presumably a vacancy or a copper, carbon, or oxygen interstitial.
Keywords
Germanium Ionization Energy Acceptor Level Azerbaijan Hole Concentration
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