Antireflective structures in CdTe and CdZnTe surfaces by ECR plasma etching
A rigorous coupled-wave analysis procedure has been used to design structures which can be embedded in Cd(Zn)Te surfaces to make them antireflective in the 8–14 m spectral region. Gray scale lithography was used to produce these patterns in photoresist layers. High fidelity transfer of patterns into Cd(Zn)Te surfaces was accomplished by utilizing an electron cyclotron resonance plasma with etch selectivity values in the range of 6.7–13.3. Transmission values at patterned surfaces were measured to be as high as 99.3%.
Key wordsCdZnTe antireflective ECR plasma etching
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