Journal of Electronic Materials

, Volume 22, Issue 5, pp 567–572 | Cite as

A study of the evolution process of antiphase boundaries in GaAs on Si

  • S. I. Molina
  • G. Aragón
  • R. García
  • Y. González
  • L. González
  • F. Briones
Regular Issue Paper


A study by high resolution electron microscopy and conventional transmission electron microscopy of the process of closure of antiphase boundaries (APB) in atomic layer molecular beam epitaxy (ALMBE) grown GaAs on silicon is reported. A parallelepipedical shape, closed at the top by another boundary with a semispheric shape, is proposed for the during growth suppressed APBs in GaAs epilayers. Antiphase boundaries are mostly located in {100} plans. Sixty degree dislocations are involved in the process of bending of APBs from {110} to {11n} planes; this bending is the initial step which must take place to get a single domain by interaction of two APBs. The proposed shape for closed APBs is in good agreement with the quasi two-dimensional growth observed for GaAs grown on silicon by ALMBE.

Key words

ALMBE antiphase boundaries GaAs on silicon 


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Copyright information

© The Mineral,Metal & Materials Society,Inc. 1993

Authors and Affiliations

  • S. I. Molina
    • 1
  • G. Aragón
    • 1
  • R. García
    • 1
  • Y. González
    • 2
  • L. González
    • 2
  • F. Briones
    • 2
  1. 1.Departamento de Química InorgánicaUniversidad de CadizPuerto Real (Cadiz)Spain
  2. 2.Centro Nacional de MicroelectrönicaCSICMadridSpain

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