Journal of Electronic Materials

, Volume 3, Issue 4, pp 791–820 | Cite as

Microstructure of amorphous and crystalline electrodeposited Ni-P and Co-P alloys

  • Y. S. Tyan
  • L. E. Toth
Article
Received:
Revised:

Abstract

A new model for the microstructure of electrodeposited Ni-P and Co-P alloys is presented based upon the concept of grain boundary segregation. The model correctly explains the compositional dependence of grain size as well as other experimental data. The model also predicts an anomalous low temperature heat capacity and a low temperature resistivity minimum. Both these predictions are confirmed experimentally.

Key words

specific heats electrical resistivities magnetic properties thick films. 
This is a preview of subscription content, log in to check access.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    A. Brenner,. “Electrodeposition of Alloys≓ Academic Press, N.Y. (1963).Google Scholar
  2. 2.
    G. S. Cargill III, J. Appl. Phys.41, 12 (1970).CrossRefGoogle Scholar
  3. 3.
    B. G. Bagley and D. Turnbull, J. Appl. Phys.39, 5681 (1968).CrossRefGoogle Scholar
  4. 4.
    A. W. Simpson and D. R. Brambley, Phys. Stat. Sol. (b)49, 685 (1972).Google Scholar
  5. 5.
    A. W. Simpson and D. R. Brambley, Phys. Stat. Sol. (b)43, 291 (1971).Google Scholar
  6. 6.
    A. H. Graham, R. W. Lindsay and H. J. Read, J. Electro- chem. Soc.112, 401 (1965).CrossRefGoogle Scholar
  7. 7.
    A. W. Goldenstein, W. Rostoker, F. Schossberger and G. Gutzeit, J. Electrochem. Soc.104, 104 (1957).CrossRefGoogle Scholar
  8. 8.
    J. P. Randin, P. A. Maire, E. Saurer and H. E. Hintermann, J. Electrochem. Soc..114, 442 (1967).CrossRefGoogle Scholar
  9. 9.
    J. P. Randin and H. E. Hintermann, J. Electrochem. Soc.117, 160 (1970).CrossRefGoogle Scholar
  10. 10.
    J. P. Randin and H. E. Hintermann, J. Electrochem. Soc.115, 480 (1968).CrossRefGoogle Scholar
  11. 11.
    P. A. Albert, Z. Kovac, H. R. Lilienthal, T. R. McGuire and Y. Nakamura, J. Appl. Phys.38, 1258 (1967).CrossRefGoogle Scholar
  12. 12.
    P. W. Palmberg and H. L. Marcus, ASM Trans.62, 1016 (1969).Google Scholar
  13. 13.
    P. V. Ramasubramanian, Ph.D. Thesis, University of Minnesota (1971).Google Scholar
  14. 14.
    J. W. Cahn and J. E. Hilliard, Acta Met.7, 219 (1959).CrossRefGoogle Scholar
  15. 15.
    H. Macda, Trans. Natl. Res. Inst. Met.12, 211 (1970).Google Scholar
  16. 16.
    J. S. Sallo and J. M. Carr, J. Appl. Phys.33, 1316 (1962).CrossRefGoogle Scholar
  17. 17.
    J. S. Sallo and J. M. Carr, J. Appl. Phys.34, 1309 (1963).CrossRefGoogle Scholar
  18. 18.
    G. Calugaru and M. L. Crans, Thin Solid Films5, R34 (1970).CrossRefGoogle Scholar
  19. 19.
    T. Kanbe and K. Kanematsu, Phys. Soc. Japan J.24, 1396 (1968).CrossRefGoogle Scholar
  20. 20.
    H. Levine, J. J. Rowe and F. S. Grimaldi, Anal. Chem.27, 258 (1955).CrossRefGoogle Scholar
  21. 21.
    Y. S. Tyan, M.S. Thesis, University of Minnesota (1969).Google Scholar
  22. 22.
    M. Ishikawa, M.S. Thesis, University of Minnesota (1968)Google Scholar
  23. 23.
    D. W. Osborne, H. E. Flotow and F. Schreiner, Rev. Sci. Inst.38, 159 (1967).CrossRefGoogle Scholar
  24. 24.
    J. D. Livingston and C. P. Bean, J. Appl. Phys.32, 1964 (1961).CrossRefGoogle Scholar
  25. 25.
    Y. A. Chang, L. E. Toth and Y. S. Tyan, Met. Trans.2, 315 (1971).Google Scholar
  26. 26.
    Y. Sato, Ph.D. Thesis, University of Minnesota (19 70).Google Scholar
  27. 27.
    N. C. Miller, B. Hardiman and G. A. Shirn, J. Appl. Phys.41, 1850 (1970).CrossRefGoogle Scholar
  28. 28.
    S. Doniach and S. Engelsberg, Rev. Phys. Letters17, 750 (1966).CrossRefGoogle Scholar
  29. 29.
    P. Thadani and L. E. Toth, to be published.Google Scholar
  30. 30.
    B.D. Cullity, “Introduction to magnetic materials,≓ Addison-Wesley Publishing Co. (1972).Google Scholar
  31. 31.
    C. A. Neugebauer, Thin Solid Films6, 443 (1970).CrossRefGoogle Scholar
  32. 32.
    L. I. Maissel, “Handbook Thin Film Technology≓ Chap. 13, edited by L. I. Maissel and R. Glang, New York, McGraw-Hill (1970).Google Scholar
  33. 33.
    J. I. Gittleman, Y. Goldstein and S. Bozowski, Phys. Rev.B3, 3609 (1972).Google Scholar
  34. 34.
    J. G. Simmons, J. Appl. Phys.35, 2472 (1964).CrossRefGoogle Scholar
  35. 35.
    J. Frenkel, Phys. Rev.36, 1604 (1930).CrossRefGoogle Scholar
  36. 36.
    C. A. Neugebauer and M. B. Webb, J. Appl. Phys.33, 74 (1962).CrossRefGoogle Scholar
  37. 37.
    R. M. Hill, Proc. Roy. Soc.A309, 379, 397 (1969).Google Scholar
  38. 38.
    T. E. Hartman, J. Appl. Phys.34, 943 (1963).CrossRefGoogle Scholar
  39. 39.
    C. Feldman, J. Appl. Phys.34, 1710 (1963).CrossRefGoogle Scholar
  40. 40.
    Figures showing the resistance behavior of these alloys may be found in Y. S. Tyan, Ph.D. Thesis, University of Minnesota (1973).Google Scholar
  41. 41.
    J. M. Ziman, “Electrons and Phonons,≓ Oxford University Press (1960).Google Scholar
  42. 42.
    R. Hasegawa, Phys. Lett. A36A, 425 (1971).CrossRefGoogle Scholar
  43. 43.
    P. W. Anderson, Phys. Rev.109, 1492 (1958).CrossRefGoogle Scholar
  44. 44.
    N. F. Mott and E. A. Davis, “Electronic Process in Non-Crystalline Materials,≓ Clarendon Press, Oxford (1971).Google Scholar
  45. 45.
    S. C. H. Lin, J. Appl. Phys.40, 2173 (1969).CrossRefGoogle Scholar
  46. 46.
    P. Maitrepierre, J. Appl. Phys.41, 498 (1970).CrossRefGoogle Scholar
  47. 47.
    R. Hasegawa and C. C. Tsuei, Phys. Rev.132, 1631 (1970).Google Scholar
  48. 48.
    R. Hasegawa and C. C. Tsuei, Phys. Rev.B3, 214 (1971).Google Scholar
  49. 49.
    J. Kondo, Prog. Theor. Phys.32, 37 (1964).CrossRefGoogle Scholar
  50. 50.
    T. Skoskiewiez and B. Baranowski, Solid State Commun.7, 647 (1969).CrossRefGoogle Scholar

Copyright information

© American Institute of Mining, Metallurgical, and Petroleum Engineers, Inc 1974

Authors and Affiliations

  • Y. S. Tyan
    • 1
  • L. E. Toth
    • 1
  1. 1.Department of Chemical Engineering and Materials ScienceUniversity of MinnesotaMinneapolis

Personalised recommendations