Microsystem Technologies

, Volume 2, Issue 2, pp 46–49 | Cite as

The copolymer of methyl methacrylate and methacrylic acid as a sensitive resist for deep-etch X-ray lithography

  • T. Numazawa
  • Y. Hirata
  • H. Takada
Technical Papers
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Accepted:

Abstract

The copolymer of methyl methacrylate and methacrylic acid was developed as a new sensitive resist for the LIGA (Lithographie, Galvanoformung, Abformtechnik) process. The resist exposures were carried out at the LIGA beamline of a superconducting compact light source NIJI-III. The absorbed energy density required to remove the entire exposed resist and produce a defect-free microstructure was between 0.4 and 7 kJ/cm3 (4 and 20 kJ/cm3 for PMMA). The sensitivity and patterning depth of the copolymer were 10 times and 3.5 times, respectively, those of poly methyl methacrylate (PMMA) assuming that both resists were exposed to synchrotron radiation (SR) of the same wavelength. Moreover, the copolymer showed high contrast and process stability.

Keywords

PMMA Methyl Methacrylate Methacrylic Acid Piezoelectric Composite Structural Height 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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References

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Copyright information

© Springer-Verlag 1996

Authors and Affiliations

  • T. Numazawa
    • 1
  • Y. Hirata
    • 1
  • H. Takada
    • 1
  1. 1.Harima Research LaboratoriesSumitomo Electric Industries, LtdKamigori, HyogoJapan

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