Advertisement

Reaction Kinetics and Catalysis Letters

, Volume 48, Issue 1, pp 31–36 | Cite as

Characterization of Cu−Rh/SiO2 by temperature-programmed desorption (TPD) of hydrogen

  • Steven S. C. Chuang
  • Yee Soong
  • Richard P. Noceti
  • Richard R. Schehl
Article

Abstract

The presence of Cu on Rh/SiO2 inhibited H2 chemisorption at 303 K and suppressed CO hydrogenation. TPD study shows that chemisorption of H2 on Cu−Rh/SiO2 is an activated process at 303 K.

Keywords

Hydrogen Physical Chemistry Catalysis Chemisorption 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Abstract

Присутствие Cu на Rh/SiO2 ингибирует хемосорбцию H2 при 303 К и подавляет гидрирование CO. Результаты исследований ТПД свидетельствуют о том, что хемосорбция H2 на Cu−Rh/SiO2 является активированным процессом при температуре 303 К.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    V. Ponec: Adv. Catal.,32, 149 (1983).Google Scholar
  2. 2.
    W.A.A. Van Barneveld, V. Ponec: J. Catal.,89, 542 (1984).Google Scholar
  3. 3.
    C.H.F. Peden, D.W. Goodman: Ind. Eng. Chem. Fundam.25, 58 (1986).Google Scholar
  4. 4.
    J.H. Sinfelt: Bimetallic Catalysts: Discoveries, Concepts, and Applications. Wiley, New York 1983.Google Scholar
  5. 5.
    S.S.C. Chuang, S.I. Pien, R. Narayanan: Appl. Catal.,57, 241 (1990).Google Scholar
  6. 6.
    A.J. Rouco, G.L. Haller: J. Catal.,72, 246 (1981).Google Scholar
  7. 7.
    A.J. Rouco, G.L. Haller, J.A. Oliver, C. Kemball: J. Catal.,84, 279 (1983).Google Scholar
  8. 8.
    S.Y. Lai, J.C. Vickerman: J. Catal.,90, 237 (1984).Google Scholar
  9. 9.
    E. Isreal, D.J. Dwyer, E. Iglesia: Appl. Catal.,12, 201 (1984).Google Scholar
  10. 10.
    T. Okuhara, T. Jin, Y. Zhou, J. M. White: J. Phys. Chem.,92, 4141 (1988).Google Scholar
  11. 11.
    S.S.C. Chuang, S.I. Pien, K. Ghosal, Y. Soong, R.P. Noceti, R.R. Schehl: Appl. Catal.,70, 101 (1991).Google Scholar
  12. 12.
    C.H. Bartholomew: Catal. Lett.,7, 27 (1990).Google Scholar
  13. 13.
    M.S. Tzou, M. Kusunoki, K. Asakura, H. Kuroda, G. Moretti, W.M.H. Sachtler: J. Phys. Chem.,517, 496 (1991).Google Scholar

Copyright information

© Akadémiai Kiadó 1992

Authors and Affiliations

  • Steven S. C. Chuang
    • 1
  • Yee Soong
  • Richard P. Noceti
  • Richard R. Schehl
    • 2
  1. 1.Department of Chemical EngineeringUniversity of AkronAkron
  2. 2.Pittsburgh Energy Technology CenterU.S. Department of EnergyPittsburhgUSA

Personalised recommendations