Reaction Kinetics and Catalysis Letters

, Volume 48, Issue 1, pp 31–36 | Cite as

Characterization of Cu−Rh/SiO2 by temperature-programmed desorption (TPD) of hydrogen

  • Steven S. C. Chuang
  • Yee Soong
  • Richard P. Noceti
  • Richard R. Schehl
Article

Abstract

The presence of Cu on Rh/SiO2 inhibited H2 chemisorption at 303 K and suppressed CO hydrogenation. TPD study shows that chemisorption of H2 on Cu−Rh/SiO2 is an activated process at 303 K.

Abstract

Присутствие Cu на Rh/SiO2 ингибирует хемосорбцию H2 при 303 К и подавляет гидрирование CO. Результаты исследований ТПД свидетельствуют о том, что хемосорбция H2 на Cu−Rh/SiO2 является активированным процессом при температуре 303 К.

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Copyright information

© Akadémiai Kiadó 1992

Authors and Affiliations

  • Steven S. C. Chuang
    • 1
  • Yee Soong
  • Richard P. Noceti
  • Richard R. Schehl
    • 2
  1. 1.Department of Chemical EngineeringUniversity of AkronAkron
  2. 2.Pittsburgh Energy Technology CenterU.S. Department of EnergyPittsburhgUSA

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