Abstract
The shape of the plasma plume induced by KrF-laser irradiation of Y−Ba−Cu−O, Cu−O, and Cu targets in O2 and N2 atmosphere was investigated by time-integrated photography. The dependence on laser fluence, spot size, and pressure of the ambient gas was studied. Special emphasis was put on the ablation of YBCO in O2 atmosphere under experimental conditions that are typical for thin-film deposition.
Similar content being viewed by others
References
D. Dijkkamp, T. Venkatesan, X.D. Wu, S.A. Shaheen, N. Jisrawi, Y.H. Min-Lee, W.L. McLean, M. Croft: Appl. Phys. Lett.51, 619 (1987)
B. Roas, L. Schultz, G. Endres: Appl. Phys. Lett.53, 1557 (1988)
D. Bäuerle: Appl. Phys. Lett. A48, 527 (1989)
H.-U. Habermeier, G. Beddies, B. Leibold, G. Lu, G. Wagner: Physica C180, 17 (1991)
T. Venkatesan: Thin Solid Films216, 52 (1992)
P. Vase, Y.Q. Shen, T. Freltoft: Physica C180, 90 (1991)
P. Schwab, X.Z. Wang, D. Bäuerle: Appl. Phys. Lett.60, 2023 (1992)
P. Schwab, X.Z. Wang, S. Proyer, A. Kochemasov, D. Bäuerle: Physica C214, 257 (1993)
X.D. Wu, B. Dutta, M.S. Hedge, A. Inam, T. Venkatesan, E.W. Chase, C.C. Chang, R. Howard: Appl. Phys. Lett.54, 179 (1988)
J.P. Zheng, Z.Q. Huang D.T. Shaw, H.S. Kwok: Appl. Phys. Lett.54, 280 (1988)
K.L. Saenger: J. Appl. Phys.66, 4435 (1989)
D.B. Geohegan, D.N. Mashburn: Appl. Phys. Lett.55, 2345 (1989)
W. Marine, M. Gerri, J.M. Scotto d'Aniello, M. Sentis, Ph. Delaporte B. Forestier, B. Fontaine: Appl. Surf. Sci.54, 264 (1992)
C. Champeaux, D. Damiani, C. Girault, P. Marchet, J. Aubreton, J.P. Mercurio, A. Catherinot: InLaser Ablation of Electronic Materials: Basic Mechanisms and Applications, ed. by E. Fogarassy, S. Lazare (North-Holland, Amsterdam 1992), p. 141
P.E. Dyer, S.R. Farrar, A. Issa, P.H. Key: InLaser Ablation of Electronic Materials: Basic Mechanisms and Applications, ed. by E. Fogarassy, S. Lazare (North-Holland, Amsterdam 1992) p. 101
D.B. Geohegan: Thin Solid Films220, 138 (1992)
D.B. Geohegan: InLaser Ablation: Mechanisms and Applications, ed. by J.C. Miller, R.F. Haglund, Jr., Lect. Notes Phys., Vol. 389 (Springer, Berlin, Heidelberg 1991), p. 28
H. Izumi, K. Ohata, T. Sawada, T. Morishita, S. Tanaka: Appl. Phys. Lett.59, 597 (1991)
K. Murakami: InLaser Ablation of Electronic Materials: Basic Mechanisms and Applications, ed. by E. Fogarassy, S. Lazare (North-Holland, Amsterdam 1992) p. 125
K. Scott, J.M. Huntley, W.A. Phillips, J. Clarke, J.E. Field: Appl. Phys. Lett.57, 922 (1990)
A. Gupta, B. Braren, K.G. Casey, B.W. Hussey, R. Kelly: Appl. Phys. Lett.59, 1302 (1991)
P.E. Dyer, A. Issa, P.H. Key: Appl. Phys. Lett.57, 186 (1990)
E. Stangl, B. Luk'yanchuk, H. Schieche, K. Piglmayer, S. Anisimov, D. Bäuerle: InExcimer Lasers, ed. by L.D. Laude, NATO ASI Ser. (Kluwer, Dordrecht 1994) p. 79
J. Heitz, X.Z. Wang, P. Schwab, D. Bäuerle, L. Schultz: J. Appl. Phys.68, 2512 (1990)
D.B. Geohegan InPulsed Laser Deposition of Thin Films, ed. by D.B. Chrisey, G.K. Hubler (Wiley, New York 1994) p. 156
D.B. Geohegan: InExcimer Lasers, ed. by L.D. Laude, NATO ASI Ser. (Kluwer, Dordrecht 1994) p. 165
C. Girault, D. Damiani, J. Aubreton, A. Catherinot: Appl. Phys. Lett.54, 2035 (1989)
T. Venkatesan, X.D. Wu, A. Inam, J.B. Watchman: Appl. Phys. Lett.52, 1193 (1988)
D.H.A. Blank, R.P.J. IJsselsteijn, P.G. Out, H.J.H. Kuiper, J. Flokstra, H. Rogalla: Mater. Sci. Eng. B13, 67 (1992)