Plasma Chemistry and Plasma Processing

, Volume 12, Issue 4, pp 477–493

A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. II: Cl4, SiH4, and CH4

  • W. L. Morgan

DOI: 10.1007/BF01447255

Cite this article as:
Morgan, W.L. Plasma Chem Plasma Process (1992) 12: 477. doi:10.1007/BF01447255


The available information on low-energy electron impact cross sections for CF4, SiH4, and CHl is reviewed and critically evaluated. Of interest are the cross sections for momentum transfer, rotational, vibrational, and electronic excitation, dissociation, and attachment and ionization. Recommended cross sections are identified where feasible. Most of the cross sections reviewed have been determined by swarm techniques whereby cross sections are adjusted based on a comparison of predicted and measured electron transport, or swarm, coefficients.

Key words

Electron-molecule collisions cross sections swarm analysis plasma processing 

Copyright information

© Plenum Publishing Corporation 1992

Authors and Affiliations

  • W. L. Morgan
    • 1
  1. 1.Kinema ResearchMonument

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