Plasma Chemistry and Plasma Processing

, Volume 10, Issue 3, pp 473–491 | Cite as

Nonequilibrium modeling of low-pressure argon plasma jets; Part I: Laminar flow

  • C. H. Chang
  • E. Pfender


This paper presents a modeling attempt related to low-pressure plasma spraying processes which find increasing applications for materials processing. After a review of the various models for ionization and recombination processes, a two-temperature model for argon plasmas in chemical (ionization) nonequilibrium is established using finite rate chemistry. Results of sample calculations manifest departures from kinetic as well as chemical equilibrium, demonstrating that the conventional models based on the LTE (local thermodynamic equilibrium) assumption cannot provide proper prediction for low-pressure plasma jets.

Key words

Low-pressure ionization (chemical) nonequilibrium twotemperature plasma jets 


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Copyright information

© Plenum Publishing Corporation 1990

Authors and Affiliations

  • C. H. Chang
    • 1
  • E. Pfender
    • 1
  1. 1.Department of Mechanical EngineeringUniversity of MinnesotaMinneapolis
  2. 2.Idaho National Engineering LaboratoryEG&G Idaho, Inc.USA

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