Applied Physics A

, Volume 39, Issue 1, pp 13–20 | Cite as

Laser irradiation of chemisorbed oxygen on Si(111): Electronic states and clump formation of SiO2

  • A. J. Schell-Sorokin
  • J. E. Demuth
Contributed Papers

Abstract

The laser annealed Si(111) 1×1 surface with chemisorbed oxygen at submonolayer coverages and its irradiation with a ruby laser has been studied with ultraviolet photoelectron spectroscopy and high-resolution electron-energy-loss spectroscopy. The surface oxide which forms directly upon O2 exposure is found to be similar to that which forms on the Si(111) cleaved 2×1 and the 7×7 reconstructed surfaces. Ruby-laser irradiation converts this surface oxide at submonolayer coverages into clumps of silicon dioxide and regions of clean silicon. Both surface oxides show electronic transitions in the visible and ultraviolet energy region which may be related to known network and point defects in vitreous and crystalline silicon dioxide.

PACS

73.20.-r 79.60.Eq 68.10.Gw 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    P.K. Boyer, G.A. Roche, W.H. Ritchie, G.J. Collins: Appl. Phys. Lett.40, 716 (1982)Google Scholar
  2. 2.
    S.E. Blum, K.H. Brown, R. Srinivasan: Appl. Phys. Lett.43, 1026 (1983)Google Scholar
  3. 3.
    J.F. Gibbons: Jpn. J. Appl. Phys.19, (Supplement 19-1) 121 (1980)Google Scholar
  4. 4.
    S.A. Schafer, S.A. Lyon: J. Vac. Sci. Technol.19, 494 (1981)Google Scholar
  5. 5.
    I.W. Boyd, J.I.B. Wilson, J.L. West: Thin Solid Films83, L173 (1981)Google Scholar
  6. 6.
    S.A. Schafer, S.A. Lyon: J. Vac. Sci. Technol.21, 422 (1982)Google Scholar
  7. 7.
    I.W. Boyd: Appl. Phys. Lett.42, 728 (1983)Google Scholar
  8. 8.
    E.M. Young, W.A. Tiller: Appl. Phys. Lett.42, 63 (1983)Google Scholar
  9. 9.
    I.W. Boyd: InSurface Studies with Lasers, ed. by F.R. Aussenegg, A. Leitner, M.E. Lippitsch (Springer, Berlin, Heidelberg, 1983) p. 193Google Scholar
  10. 10.
    I.W. Boyd, J.I.B. Wilson: Appl. Phys. Lett.41, 162 (1982)Google Scholar
  11. 11.
    I.W. Boyd: Appl. Phys. A31, 71 (1983)Google Scholar
  12. 12.
    Y.S. Liu, S.W. Chang, F. Bacon: Appl. Phys. Lett.38, 1005 (1981)Google Scholar
  13. 13.
    H. Richter, T.E. Orlowski, M. Kelly, G. Margaritondo: J. Appl. Phys.56, 2351 (1984)Google Scholar
  14. 14.
    K. Hoh, H. Koyama, K. Uda, Y. Miura: Jpn. J. Appl. Phys.19, L375 (1980)Google Scholar
  15. 15.
    A. Garulli, M. Servidori, I. Vecchi: J.Phys.D13, L199 (1980)Google Scholar
  16. 16.
    Y.S. Liu, S.W. Chiang, W. Katz: InLaser and Electron Beam Interactions with Solids, ed. by B.R. Appleton, G.K. Celler (Elsevier, New York 1982) p. 249Google Scholar
  17. 17.
    J.F.M. Westendorp, Z.L. Wang, F.W. Saris: InLaser and Electron Beam Interactions with Solids, ed. by B.R. Appleton, G.K. Celler (Elsevier, New York 1982) p. 255Google Scholar
  18. 18.
    Z.L. Wang, J.F.M. Westendorp, F.W. Saris: Nucl. Instrum. Methods211, 193 (1983)Google Scholar
  19. 19.
    A. Cros, F. Salvan, J. Derrien: Appl. Phys. A28, 241 (1982)Google Scholar
  20. 20.
    C. Fiori: Phys. Rev. Lett.52, 2077 (1984)Google Scholar
  21. 21.
    International Critical Tables of Numerical Data, Physics, Chemistry, and Technology, ed. by E.W. Washburn (McGraw-Hill, New York 1929) Vol. V, p. 330Google Scholar
  22. 22.
    D.M. Zehner, C.W. White, G.W. Ownby: Appl. Phys. Lett.36, 56 (1980)Google Scholar
  23. 23.
    A.J. Schell-Sorokin, J.E. Demuth: Surf. Sci.157, 273 (1984)Google Scholar
  24. 24.
    D.M. Zehner. J.R. Noonan, H.L. Davis, C.W. White, G.W. Ownby: InLaser and Electron-Beam Solid Interactions and Materials Processing, ed. by J.F. Gibbons, L.O. Hess, T.W. Sigmon (Elsevier, New York 1981) p. 111Google Scholar
  25. 25.
    D.M. Zehner. J.R. Noonan, H.L. Davis, C.W. White: J. Vac. Sci. Technol.18, 852 (1981)Google Scholar
  26. 26.
    R.M. Tromp, E.J. van Loenen, M. Iwami, F.W. Saris: Solid State Commun.44, 971 (1982)Google Scholar
  27. 27.
    Y.J. Chabal, J.E. Rowe, D.A. Zwemer: Phys. Rev. Lett.46, 600 (1981)Google Scholar
  28. 28.
    H. Ibach, J.E. Rowe: Phys. Rev. B10, 710 (1974)Google Scholar
  29. 29.
    J.E. Rowe, H. Ibach, H. Froitzheim: Surf. Sci.48, 44 (1975)Google Scholar
  30. 30.
    C.M. Garner, I. Lindau, J.N. Miller, P. Pianetta, W.E. Spicer: J. Vac. Sci. Technol.14, 372 (1977)Google Scholar
  31. 31.
    G. Hollinger, Y. Jugnet, P. Pertosa, L. Porte, T.M. Duc: In Proc. 7th Intern. Vac. Congr. and 3rd Intern. Conf. Solid Surfaces (Vienna, 1977), ed. by R. Dobrozemsky, F. Rüdenauer, F.P. Vlehböck, A. Brett, p. 2229Google Scholar
  32. 32.
    G.M. Guichar, C.A. Sébenne, G.A. Garry, M. Balkanski: Surf. Sci.58, 374 (1976)Google Scholar
  33. 33.
    G. Hollinger, F.J. Himpsel: Phys. Rev. B28, 3651 (1983)Google Scholar
  34. 34.
    H. Ibach: Phys. Rev. Lett.27, 253 (1971)Google Scholar
  35. 35.
    H. Ibach, K. Horn, R. Dorn, H. Lüth: Surf. Sci.38, 433 (1973)Google Scholar
  36. 36.
    H. Ibach, H.D. Bruchmann, H. Wagner: Appl. Phys. A29, 113 (1982)Google Scholar
  37. 37.
    T.H. DiStefano, D.E. Eastman: Phys. Rev. Lett.27, 1560 (1971)Google Scholar
  38. 38.
    L.F. Wagner, W.E. Spicer: Phys. Rev. B9, 1512 (1974)Google Scholar
  39. 39.
    J.E. Rowe: Appl. Phys. Lett.25, 576 (1974)Google Scholar
  40. 40.
    G. Hollinger: Appl. Surf. Sci.8, 318 (1981)Google Scholar
  41. 41.
    F.L. Galeener, G. Lucovsky: Phys. Rev. Lett.37, 1474 (1976)Google Scholar
  42. 42.
    I.W. Boyd, J.I.B. Wilson: J. Appl. Phys.53, 4166 (1982)Google Scholar
  43. 43.
    F.L. Galeener, A.J. Leadbetter, M.W. Stringfellow: Phys. Rev. B27, 1052 (1983)Google Scholar
  44. 44.
    S.K. Sharma, D.W. Matson, J.A. Philpotts, T.L. Roush: J. Non-Cryst. Solids68, 99 (1984)Google Scholar
  45. 45.
    P.H. Gaskell, D.W. Johnson: J. Non-Cryst. Solids20, 153 (1976)Google Scholar
  46. 46.
    M.L. Lang, W.L. Wolfe: Appl. Opt.22, 1267 (1983)Google Scholar
  47. 47.
    D.L. Mills: Surf. Sci.48, 59 (1975)Google Scholar
  48. 48.
    L. Schumann, A. Lehmann, H. Sobotta, V. Riede, U. Teschner, K. Hübner: Phys. Stat. Solidi B110, K69 (1982)Google Scholar
  49. 49.
    M. Nakamura, Y. Mochizuki, K. Usami, Y. Itoh, T. Nozaki: Solid State Commun.50, 1079 (1984)Google Scholar
  50. 50.
    P.H. Gaskell: Discuss. Faraday Soc.50, 82 (1971)Google Scholar
  51. 51.
    P.H. Gaskell, D.W. Johnson: J. Non-Cryst. Solids20, 171 (1976)Google Scholar
  52. 52.
    J.E. Demuth, B.N.J. Persson, A.J. Schell-Sorokin: Phys. Rev. Lett.51, 2214 (1983)Google Scholar
  53. 53.
    H. Froitzheim, H. Ibach, D.L. Mills: Phys. Rev. B11, 4980 (1975)Google Scholar
  54. 54.
    J.E. Rowe, H. Ibach: Phys. Rev. Lett.31, 102 (1973)Google Scholar
  55. 55.
    D.E. Aspnes, A.A. Studna: Phys. Rev. B27, 985 (1983)Google Scholar
  56. 56.
    V.M. Bermudez, V.H. Ritz: Phys. Rev. B20, 3446 (1979)Google Scholar
  57. 57.
    J. Olivier, P. Faulconnier, R. Poirier: InThe Physics of SiO 2 and Its Interfaces, ed. by S.T. Pantelides, G. Lucovsky, F.L. Galeener (Pergamon, New York, 1978) p. 89Google Scholar
  58. 58.
    H. Ibach, J.E. Rowe: Phys. Rev. B9, 1951 (1974)Google Scholar
  59. 59.
    R. Ludeke, A. Koma: Phys. Rev. Lett.34, 1170 (1975)Google Scholar
  60. 60.
    Y.W. Chung, W. Siekhaus, G.A. Somorjai: Surf. Sci.58, 341 (1976)Google Scholar
  61. 61.
    K. Fujiwara, H. Ogata, M. Nishijima: Solid State Commun.21, 895 (1977)Google Scholar
  62. 62.
    K. Fujiwara, H. Ogata: J. Appl. Phys.48, 4360 (1977)Google Scholar
  63. 63.
    N. Lieske, R. Hezel: Thin Solid Films61, 197 (1979)Google Scholar
  64. 64.
    D.E. Aspnes, J.B. Theeten: J. Appl. Phys.50, 4928 (1979)Google Scholar
  65. 65.
    D.E. Aspnes, J.B. Theeten: Phys. Rev. Lett.43, 1046 (1979)Google Scholar
  66. 66.
    K.L. Bedford, A.B. Kunz: Solid State Commun.38, 411 (1981)Google Scholar
  67. 67.
    G. Hochstrasser, J.F. Antonini: Surf. Sci.32, 644 (1972)Google Scholar
  68. 68.
    J.F. Antonini, G. Hochstrasser: Surf. Sci.32, 665 (1972)Google Scholar
  69. 69.
    E. Lell, N.J. Kreidl, J.R. Hensler: InProgress in Ceramic Science, Vol.4, ed. by J.R. Burke (Pergamon, Oxford 1966) p. 1Google Scholar
  70. 70.
    E. Lell: Phys. Chem. Glasses3, 84 (1962)Google Scholar
  71. 71.
    A.V. Amosov, S.F. Malyshkin: Sov. J. Glass Phys. Chem.8, 70 (1982)Google Scholar
  72. 72.
    A.V. Amosov: Sov. J. Glass Phys. Chem.5, 563 (1979)Google Scholar
  73. 73.
    N.N. Gerasimenko, G.M. Tseitlin, S.L. Vasilev: Phys. Status Solidi A62, K169 (1980)Google Scholar
  74. 74.
    M. Antonini, P. Camagni, A. Manara, L. Moro: J. Non-Cryst. Solids44, 321 (1981)Google Scholar
  75. 75.
    L.N. Skuja, A.N. Trukhin, A.E. Plaudis: Phys. Stat. Solidi A84, K153 (1984)Google Scholar
  76. 76.
    L.N. Skuja, A.N. Streletsky, A.B. Pakovich: Solid State Commun.50, 1069 (1984)Google Scholar
  77. 77.
    G.N. Greaves: J. Non-Cryst. Solids32, 295 (1979)Google Scholar
  78. 78.
    L.N. Skuja, A.R. Silin: Phys. Stat. Solidi A56, K11 (1979)Google Scholar
  79. 79.
    L.N. Skuja, A.R. Silin: Phys. Stat. Solidi A70, 43 (1982)Google Scholar
  80. 80.
    J.H. Stathis, M.A. Kastner: Philos. Mag. B49, 357 (1984)Google Scholar
  81. 81.
    Ph. Avouris, J.E. Demuth: InSurface Studies with Lasers, ed. by F.R. Aussenegg, A. Leitner, M.E. Lippitsch. (Springer, Berlin, Heidelberg 1983) p. 24Google Scholar
  82. 82.
    D.E. Eastman, W.D. Grobman: Phys. Rev. Lett.28, 1378 (1972)Google Scholar
  83. 83.
    L.F. Wagner, W.E. Spicer: Phys. Rev. Lett.28, 1381 (1972)Google Scholar
  84. 84.
    R.A. Pollak, F.J. Himpsel, G. Hollinger, R.F. Marks, B. Reihl, C.W. White, D.M. Zehner, R.F. Wood: To be publishedGoogle Scholar
  85. 85.
    A.W. Adamson:Physical Chemistry of Surfaces, 4th ed. (Wiley, New York 1982)Google Scholar
  86. 86.
    W.D. Kingery, M. Humenik, Jr.: J. Am. Ceram. Soc.57, 359 (1953)Google Scholar
  87. 87.
    P.H. Keck, W. Van Horn: Phys. Rev.91, 512 (1953)Google Scholar
  88. 88.
    Y.M. Shashkov, T.P. Kolesnikova: Russ. J. Phys. Chem.37, 747 (1963)Google Scholar
  89. 89.
    W.D. Kingery, H.K. Bowen, D.R. Uhlmann:Introduction to Ceramics, 2nd ed. (Wiley, New York 1976) pp. 206–207Google Scholar
  90. 90.
    E. Yablonovitch, T. Gmitter: Appl. Phys. Lett.45, 63 (1984)Google Scholar
  91. 91.
    K.M. Kim, S. Berkman, H.E. Temple, G.W. Cullen: J. Cryst. Growth50, 212 (1980)Google Scholar
  92. 92.
    F.J. Himpsel, D.E. Eastman, P. Heimann, B. Reihl, C.W. White, D.M. Zehner: Phys. Rev. B24, 1120 (1981)Google Scholar
  93. 93.
    D.M. Zehner, C.W. White, P. Heimann, B. Reihl, F.J. Himpsel, D.E. Eastman: Phys. Rev. B24, 4875 (1981)Google Scholar
  94. 94.
    G.J.R. Jones, B.W. Holland: Solid State Commun.53, 45 (1985)Google Scholar
  95. 95.
    J.J. Gilman: J. Appl. Phys.31, 2208 (1960)Google Scholar
  96. 96.
    R.J. Jaccodine: J. Electrochem. Soc.110, 524 (1963)Google Scholar
  97. 97.
    B.N. Oshcherin: Russ. J. Phys. Chem.44, 309 (1970)Google Scholar

Copyright information

© Springer-Verlag 1986

Authors and Affiliations

  • A. J. Schell-Sorokin
    • 1
  • J. E. Demuth
    • 1
  1. 1.IBM Thomas J. Watson Research CenterYorktown HeightsUSA

Personalised recommendations