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Journal of Materials Science

, Volume 22, Issue 6, pp 2277–2280 | Cite as

High temperature oxidation of hot-pressed aluminium nitride by water vapour

  • Tsugio Sato
  • Kiyotaka Haryu
  • Tadashi Endo
  • Masahiko Shimada
Article

Abstract

Hot pressed AIN without additives was oxidized et 1100 to 1400°C in dry air, wet air and wet nitrogen gas atmospheres with 1.5 to 20 kPa of water vapour pressure. AIN was oxidized by both air and water vapour, and formed α-Al2O3 film on the surface above 1150°C. The oxidation kinetics in air were parabolic end were promoted by water vapour. On the other hand, the oxidation kinetics in wet nitrogen were linear below 1250°C and parabolic above 1350°C. The oxidation rate in wet nitrogen was much greater than that in wet air. The rate of oxidation increased with increasing temperature until 1350°C, and then decreased. The parabolic rate constant decreased with increasing temperature and increased linearly with increasing water vapour pressure. The linear rate constant at 1150 to 1250° C increased with increasing the temperature with the apparent activation energy of 250 kJ mol−1. The relation between the linear rate constant and water vapour pressure was of the Langmuir type.

Keywords

Water Vapour Nitride Apparent Activation Energy Temperature Oxidation High Temperature Oxidation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

  1. 1.
    G. Long andM. Foster,J. Amer. Ceram. Soc. 42 (1959) 53.Google Scholar
  2. 2.
    T. Renner,Z. Anorg. Allgem. Chem. 298 (1952) 22.Google Scholar
  3. 3.
    K. M. Taylor andC. Lenie,J. Electrochem. Soc. 107 (1960) 308.Google Scholar
  4. 4.
    N. G. Coles, D. R. Glasson andS. A. A. Jayaweera,J. Appl. Chem. 19 (1969) 178.Google Scholar
  5. 5.
    P. Boch, J. C. Galndus, J. Jarrige, J. P. Lecompte andJ. Mexmain,Ceramics Int. 8 (1982) 34.Google Scholar
  6. 6.
    V. A. Lavrenko andA. F. Alexeev,ibid. 9 (1983) 80.Google Scholar
  7. 7.
    T. Sato, S. Ohtaki, T. Endo andM. Shimada,J. Amer. Ceram. Soc. 68 (1985) C320.Google Scholar
  8. 8.
    D. R. Stull andH. Prophet (eds), JANAF Thermochemical Tables, 2nd edn NSRDS-NBS 37 (US Government Printing Office, Washington, DC, 1971).Google Scholar

Copyright information

© Chapman and Hall Ltd. 1987

Authors and Affiliations

  • Tsugio Sato
    • 1
  • Kiyotaka Haryu
    • 1
  • Tadashi Endo
    • 1
  • Masahiko Shimada
    • 1
  1. 1.Department of Applied Chemistry, Faculty of EngineeringTohoku UniversitySendaiJapan

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