Journal of Materials Science

, Volume 22, Issue 6, pp 2277–2280 | Cite as

High temperature oxidation of hot-pressed aluminium nitride by water vapour

  • Tsugio Sato
  • Kiyotaka Haryu
  • Tadashi Endo
  • Masahiko Shimada


Hot pressed AIN without additives was oxidized et 1100 to 1400°C in dry air, wet air and wet nitrogen gas atmospheres with 1.5 to 20 kPa of water vapour pressure. AIN was oxidized by both air and water vapour, and formed α-Al2O3 film on the surface above 1150°C. The oxidation kinetics in air were parabolic end were promoted by water vapour. On the other hand, the oxidation kinetics in wet nitrogen were linear below 1250°C and parabolic above 1350°C. The oxidation rate in wet nitrogen was much greater than that in wet air. The rate of oxidation increased with increasing temperature until 1350°C, and then decreased. The parabolic rate constant decreased with increasing temperature and increased linearly with increasing water vapour pressure. The linear rate constant at 1150 to 1250° C increased with increasing the temperature with the apparent activation energy of 250 kJ mol−1. The relation between the linear rate constant and water vapour pressure was of the Langmuir type.


Water Vapour Nitride Apparent Activation Energy Temperature Oxidation High Temperature Oxidation 
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Copyright information

© Chapman and Hall Ltd. 1987

Authors and Affiliations

  • Tsugio Sato
    • 1
  • Kiyotaka Haryu
    • 1
  • Tadashi Endo
    • 1
  • Masahiko Shimada
    • 1
  1. 1.Department of Applied Chemistry, Faculty of EngineeringTohoku UniversitySendaiJapan

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