Journal of Applied Electrochemistry

, Volume 21, Issue 8, pp 697–702 | Cite as

Characterization of copper oxidation by linear potential sweep voltammetry and UV-Visible-NIR diffuse reflectance spectroscopy

  • M. Lenglet
  • K. Kartouni
  • D. Delahaye


The aim of this study was to characterize the compounds grown on copper during oxidation at low temperature (T<573 K) in air by electrochemical and optical methods. The following oxides have been characterized: a precursor CuxO of mixed valency character, a non stoichiometric cuprous oxide, CuO and its precursor. The mechanism of reduction has been established for layers containing CuO and a non stoichiometric copper(I) oxide. CuO is reduced before cuprous oxide. In complicated cases, it is impossible to draw conclusions from the characteristics of the electrochemical reduction (the first step of CuO reduction and the reduction of Cu(I) species specific of the non-stoichiometry are observed at the same potential). Nevertheless, the association of a non-destructive technique such as diffuse reflectance spectroscopy and electrochemical methods allows identification of the different species present in corrosion layers on copper surfaces.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. [1]
    H. Wieder and A. W. Czanderna,J. Phys. Chem. 66 (1962). 816.Google Scholar
  2. [2]
    H. Neumeister and W. Jaenike,Z. Phys. Chem. B 108 (1977) 217.Google Scholar
  3. [3]
    M. Lenglet, J. M. Machefert, J. M. Claude, B. Lefez, J. Lopitaux and A. D'Huysser,Surf. Interf. Anal. (1990), in press.Google Scholar
  4. [4]
    J. M. Machefert, M. Lenglet, D. Blavette, A. Menand and A. D'Huysser, ‘Structure and Reactivity of Surfaces’, Elsevier Sciences Publishers B. V., Amsterdam (1989) p. 625.Google Scholar
  5. [5]
    M. Balkanski, Y. Petroff and D. Trivich,Solid. State Commun. 5 (1967) 85.Google Scholar
  6. [6]
    S. Brahms, J. P. Dahl and S. Nikitine,J. Phys. (1967) C3–28.Google Scholar
  7. [7]
    P. Marksteiner, P. Blaha and K. Schwarz,Z. Phys. B 64 (1986) 119.Google Scholar
  8. [8]
    W. Y. Ching, Y. N. Xu and K. W. Wong,Phys. Rev. B 40 (1989) 7864.Google Scholar
  9. [9]
    J. M. Machefert, A. D'Huysser, M. Lenglet, J. Lopitaux and D. Delahaye,Mat. Res. Bull. 23 (1988) 1379.Google Scholar
  10. [10]
    M. Lenglet, J. Arsene, J. M. Machefert, P. Leterrible and J. M. Welter,Analusis 16, (1988) 2.Google Scholar
  11. [11]
    N. A. Tolstoi and V. A. Bonch-Bruevich,Sov. Phys. Solid State 13 (1971) 1135.Google Scholar
  12. [12]
    J. M. Machefert, Thèse, Rouen (1990).Google Scholar
  13. [13]
    B. Lefez and M. Lenglet, unpublished results.Google Scholar
  14. [14]
    C. Duvury, D. J. Kenway and F. L. Weichman,J. Lum. 10 (1975) 415.Google Scholar
  15. [15]
    R. G. Kaufman and R. T. Hawkins,J. Electrochem. Soc. 131 (1984) 385.Google Scholar
  16. [16]
    R. G. Kaufman and R. T. Hawkins,J. Electrochem. Soc. 133 (1986) 2652.Google Scholar
  17. [17]
    H. Wieder and A. W. Czanderna,J. Appl. Phys. 37, (1966). 184.Google Scholar
  18. [18]
    F. H. Chapple and F. S. Stone,Proc. Brit. Ceram. Soc. 1 (1964) 45.Google Scholar
  19. [19]
    R. H. Lambert and D. J. Trevoy,J. Electrochem. Soc. 105 (1958) 18.Google Scholar
  20. [20]
    H. Pops and D. R. Hennessy,Wire J. 10 (1977) 50.Google Scholar
  21. [21]
    H. Strehblow and B. Titze,Electrochim. Acta 25 (1980) 839.Google Scholar
  22. [22]
    J. Guinement, Thèse Ingénieur Docteur, Paris VI (1985).Google Scholar
  23. [23]
    R. L. Deutscher and R. Woods,J. Appl. Electrochem. 16 (1986) 413.Google Scholar
  24. [24]
    M. O'Keeffe and F. S. Stone,Proc. Roy. Soc. A 267 (1962) 501.Google Scholar
  25. [25]
    M. E. Martins and A. J. Arvia,J. Electroanal. Chem. 165 (1984) 135.Google Scholar
  26. [26]
    M. R. Gennero de Chialvo, S. L. Marchiano and A. J. Arvia,J. Appl. Electrochem. 14, (1984) 165.Google Scholar

Copyright information

© Chapman and Hall Ltd. 1991

Authors and Affiliations

  • M. Lenglet
    • 1
  • K. Kartouni
    • 1
  • D. Delahaye
    • 1
  1. 1.Laboratoire de Physicochimie des MatériauxINSA-Université de RouenMont-Saint-Aignan CedexFrance

Personalised recommendations