Journal of Applied Electrochemistry

, Volume 22, Issue 3, pp 301–303 | Cite as

Primary current distribution in the Hull cell and related trapezoidal geometries

  • A. C. West
  • M. Matlosz
  • D. Landolt
Short Communication

Keywords

Physical Chemistry Hull Current Distribution Hull Cell Primary Current Distribution 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notation

a, b, A, B

parameters used to approximate the analytic solution, (see Equations 8, 9 and 10)

i(x)/iavg

normalized current distribution

(i(x)/iavg)app

approximation to the normalized current distribution

j

√(−1)

K1,K2,c, h'

constants used in the conformal mappings (see Equations 1 and 2 and Fig. 1)

RkΔ

dimensionless resistance of the cell shown in Fig. 1a

x, y

(dimensionless) real and imaginary components of the complex coordinatez

z, w, Λ

coordinate systems used in the conformal mappings (see Fig. 1)

ε(x)

local error in the approximations to the current distributions, defined by Equation 11

θ

angle, radians (see Fig. 1a)

π

3.1415926...

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References

  1. [1]
    R. O. Hull,Am. Electroplat. Soc. 27 (1939) 52.Google Scholar
  2. [2]
    W. Nohse, ‘Die Untersuchung galvanischer Bäder in der Hull-Zelle’, 3rd edition, Verlag Saulgau, Germany (1984).Google Scholar
  3. [3]
    M. Matlosz, C. Creton, C. Clerc, and D. Landolt,J. Electrochem Soc. 134 (1987) 3015.Google Scholar
  4. [4]
    C. Clerc and D. Landolt,Electrochim. Acta 29 (1984) 787.Google Scholar
  5. [5]
    H. Fletche Monlton,Proc. London Math. Soc. (ser. 2) 3 (1905) 104.Google Scholar
  6. [6]
    L. A. Rubenfeld ‘A First Course in Applied Complex Variables’, McGraw-Hill, New York (1985).Google Scholar
  7. [7]
    R. V. Churchill, ‘Complex Variables and Applications’, 2nd edition, McGraw-Hill, New York (1960).Google Scholar
  8. [8]
    M. E. Orazem and J. Newman,J. Electrochem Soc. 131 (1984) 2857.Google Scholar
  9. [9]
    Conrad B. Diem, Bernard Newman, and Mark E. Orazem,J. Electrochem Soc. 135 (1988) 2524.Google Scholar
  10. [10]
    M. Abramowitz and I. Stegun, ‘Handbook of Mathematical Functions’, National Bureau of Standards, Washington (1964) chap. 6.Google Scholar
  11. [11]
    C. Wagner,J. Electrochem. Soc. 98 (1951) 116.Google Scholar
  12. [12]
    Norm 50950 DIN (Deutsches Institut für Normung), Mikroskopische Messung der Schichtdicke, TAB 175, Beuth Verlag GmbH, Berlin Köln (1983).Google Scholar
  13. [13]
    S. Wolfram, ‘Mathematica. A system for Doing Mathematics by Computer,’ Addison-Wesley, New York (1988).Google Scholar

Copyright information

© Chapman & Hall 1992

Authors and Affiliations

  • A. C. West
    • 1
  • M. Matlosz
    • 1
  • D. Landolt
    • 1
  1. 1.Laboratoire de Métallurgie Chimique, Département des MatériauxEcole Polytechnique Fédérale de LausanneLausanneSwitzerland

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