Estimates are given for the distribution of the depth of origin of sputtered atoms in the low-fluence limit, as well as the corresponding distribution of atoms sputtered into a given energy interval. The former distribution is well described by an exponential profile, with the characteristic depth being consistent with previous results. The latter distribution is characterized by an energy-dependent depth scale and a shape that varies from exponential at low sputtered-atom energies to inverse-power form at higher energies.
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Falcone, G., Sigmund, P. Depth of origin of sputtered atoms. Appl. Phys. 25, 307–310 (1981). https://doi.org/10.1007/BF00902988