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Fabrication of efficient phase gratings using deep u. v. lithography

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  1. 1.

    Y. Hanada, T. Suhara, H. Nishihara andJ. Koyama,Appl. Opt. 19 (1980) 2842.

  2. 2.

    A. C. Livanos, A. Katzir, A. Yariv andC. S. Hong,Appl. Phys. Lett. 30 (1977) 519.

  3. 3.

    D. C. Flanders, H. Kogelnik, R. V. Schmidt andC. V. Schank,ibid 25 (1974) 194.

  4. 4.

    G. Hatakoshi, H. Indue, K. Naito, S. Umegaki andS. Tanaka,Opt. Acta 26 (1979) 961.

  5. 5.

    K. Kobayashi andM. Seki.IEEE J. Quant. Elect. QE-16 (1980) 11.

  6. 6.

    M. Tsuda, Y. Nakamura, S. Oikawa, H. Nagata, A. Yokota, T. Tsumori, Y. Nakane andT. Mifune,Pho. Sci. Eng. 23 (1970) 290.

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Kodate, K., Takenaka, H. & Kamiya, T. Fabrication of efficient phase gratings using deep u. v. lithography. Opt Quant Electron 14, 85–88 (1982). https://doi.org/10.1007/BF00620916

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  • Communication Network
  • Phase Grating
  • Efficient Phase