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Structural study of glow discharge a — Si ∶ H films

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Abstract

Structural properties of a-Si:H films deposited on single crystalline silicon substrates have been studied by means of TEM, THEED, RHEED, and RDF. It is concluded that there are microcrystallites embedded in the amorphous phase which has a homogeneous structure. The atomic bonding configuration in the amorphous phase is discussed.

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Danesh, P., Simov, S., Pashov, N. et al. Structural study of glow discharge a — Si ∶ H films. Appl. Phys. A 39, 297–299 (1986). https://doi.org/10.1007/BF00617276

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PACS

  • 61.10