Applied Physics A

, Volume 31, Issue 2, pp 71–74 | Cite as

Incorporation of oxygen atoms into As+ implanted silicon during cw CO2 laser annealing in O2

  • Ian W. Boyd
Contributed Papers

Abstract

By annealing Si layers amorphised by ion-implantation with a cw CO2 laser beam in oxygen rich environments, it has been possible to incorporate O atoms into the recrystallized lattice. Absorption measurements on such regrown layers by infrared spectrometry have shown that the impurities are preferentially bonded into substitutional lattice sites, rather than existing interstitially. Supplementary RHEED studies have indicated thatβ-cristobalite, a crystalline form of SiO2, has been formed. These investigations highlight the importance of the ambient during cw laser annealing.

PACS

42.60 61.80 78.50 

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Copyright information

© Springer-Verlag 1983

Authors and Affiliations

  • Ian W. Boyd
    • 1
  1. 1.Physics DepartmentHeriot-Watt UniversityEdinburghScotland, UK

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