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Deposition characteristics and properties of iron nitride films by CVD using organometallic compound

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Abstract

Iron nitride films were prepared by chemical vapour deposition from the gas mixture of Fe(C5H5)2-NH3-H2-CO2. The effects of deposition parameters on the deposition characteristics were investigated. Iron nitride films were deposited above 500 ° C and the films of γ′-Fe4N single phase were deposited above 700 ° C. At 700 ° C and under the total gas flow rate from 1 to 8 l min−1, the deposition rate of the film may be controlled by the transport of Fe(C5H5)2 molecules to the surface of the deposits. At 700 °C and under the total gas flow rate of 4 l min−1, the phases and nitrogen contents of the films were determined bypNH3/pH2 3/2, the controlling factor of the nitrogen contents of the films. Decreasing of the total gas flow rate and increasingpCO2 increased the nitrogen contents of the films and phases with higher nitrogen were deposited. On the other hand, increasingpFe(C5H5)2 and the absence ofpCO2 increases the carbon contents of the films, and the phase with a greater solubility in carbon, i.e. ɛ-Fe2N, was codeposited with γ′-Fe4N. The saturation magnetization of the films deposited at 700 ° C was in good agreement with that reported for the bulk iron nitride, which depended not on the deposition conditions but on the nitrogen contents of the films.

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Funakubo, H., Kieda, N., Kato, M. et al. Deposition characteristics and properties of iron nitride films by CVD using organometallic compound. J Mater Sci 25, 5303–5312 (1990). https://doi.org/10.1007/BF00580165

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Keywords

  • Nitride
  • Carbon Content
  • Chemical Vapour Deposition
  • Nitrogen Content
  • Vapour Deposition