Journal of Materials Science

, Volume 21, Issue 6, pp 2043–2048 | Cite as

Influence of carbide formation on the strength of carbon fibres on which silicon and titanium have been deposited

  • Kuniaki Honjo
  • Akio Shindo


Silicon or titanium was deposited on the filaments of carbon fibres by chemical vapour depositions and the reactions between the deposited silicon or titanium and the carbon fibres were investigated below 1300° C. Between the silicon and the carbon fibres, β-SiC layers formed at rates of 1.5 to 3 nm in 3 h at 1300° C. These rates were 10−4 times that of the TiC formation by the reaction of titanium with carbon fibre. Furthermore, the effect of the reaction on fibre strength was investigated. By reaction with silicon, the carbon fibre at a carbonized stage decreased in strength at the beginning of the reaction, but afterwards it recovered to the original level. The carbon fibre at a graphitized stage maintained its original strength after heat treatment for several hours at 1300° C. With the TiC-coated carbon fibres, the carbon fibres decreased in strength following the relation σmd−1/2, where d is the thickness of the TiC layer.


Polymer Silicon Titanium Carbide Heat Treatment 
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  1. 1.
    M. F. Amateau, J. Composite Mater. 10 (1976) 279.Google Scholar
  2. 2.
    A. Shindo and K. Honjo, in “Preprints of the Annual Conference of the Ceramic Society of Japan”, Yokohama, May 1980 (The Ceramic Society of Japan, Tokyo, 1980) p. 38.Google Scholar
  3. 3.
    R. E. Chaney, J. Electrochem. Soc. 124 (1977) 1460.Google Scholar
  4. 4.
    W. B. Hillig, R. L. Mehan, C. R. Morelock, V. J. Decalro and W. Laskow, Amer. Ceram. Soc. Bull. 54 (1975) 1054.Google Scholar
  5. 5.
    C. A. Vansant and W. C. Phelps Jr, Trans. ASM 59 (1966) 105.Google Scholar
  6. 6.
    A. F. Wells, “Structural Inorganic Chemistry” (Oxford University Press, London, 1975) pp. 725, 1054.Google Scholar
  7. 7.
    K. Honjo and A. Shindo, Carbon (in press).Google Scholar
  8. 8.
    L. Aggour, E. Fitzer and J. Schlichting, in Proceedings of the Conference on Chemical Vapor Deposition, 5th International Conference, Slough, September 1975, edited by J. M. Blocher Jr, H. E. Hintermann and L. H. Hall (The Electrochemical Society, Pennington) p. 600.Google Scholar
  9. 9.
    T. Takahashi, K. Sugiyama and H. Ito, Kogyo Kagaku Zasshi 74 (1971) 48.Google Scholar
  10. 10.
    P. Rai-Choundhury and N. P. Formigoni, J. Electrochem. Soc. 116 (1969) 1440.Google Scholar
  11. 11.
    H. Nakashima, T. Sugano and H. Yanai, Jpn J. Appl. Phys. 5 (1966) 874.Google Scholar
  12. 12.
    J. Graul and E. Wagner, Appl. Phys. Lett. 21 (1972) 67.Google Scholar
  13. 13.
    C. J. Mogab and H. J. Leamy, J. Appl. Phys. 45 (1974) 1075.Google Scholar
  14. 14.
    A. Shindo, presented at “International Conference of Interface-Interphase in Composite Materials”, Liege, October 1983 (Society of Plastics Engineers, Benelux, 1983).Google Scholar
  15. 15.
    S. Ochiai and Y. Murakami, J. Mater. Sci. 14 (1979) 831.Google Scholar
  16. 16.
    L. M. Adesberg and L. H. Cadoff, Trans. Met. Soc. AIME 239 (1967) 933.Google Scholar

Copyright information

© Chapman and Hall Ltd. 1986

Authors and Affiliations

  • Kuniaki Honjo
    • 1
  • Akio Shindo
    • 1
  1. 1.Government Industrial Research Institute, OsakaOsakaJapan

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