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Journal of Sol-Gel Science and Technology

, Volume 2, Issue 1–3, pp 153–156 | Cite as

Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid

Code: BP10
  • J. Chiba
  • Y. Sugahara
  • K. Kuroda
Article

Abstract

Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0–4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

Keywords

dimethyldiethoxysilane oxalic acids polydimethylsiloxane reaction mechanism non-aqueous system 

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Copyright information

© Kluwer Academic Publishers 1994

Authors and Affiliations

  • J. Chiba
    • 1
  • Y. Sugahara
    • 1
  • K. Kuroda
    • 1
  1. 1.Department of Applied Chemistry, School of Science and EngineeringWaseda UniversityTokyoJapan

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