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Zur Bestimmung der Zusammensetzung und Homogenität reaktiv gesputterter SiNx-Schichten

  • H. Grübmeier
  • E. Gyarmati
  • S. Mantl
  • M. Mazurkiewicz
  • A. Naoumidis
  • X. Qui
Vorträge und Poster Dünne Filme

On the determination of the composition and homogeneity of reactively sputtered SiNx-layers

Summary

Thin SiNx-layers are to be used for joining Si3N4 ceramics. For the characterization of such layers produced by reactive sputtering using a RF magnetron cathode, the chemical composition requires determination. Layers were therefore sputtered under various sputtering conditions onto stainless steel, graphite and silicon substrates and then analyzed using three different methods: Glow Discharge Optical Spectrometry (GDOS), Electron Microprobe Analysis (EMPA) and Rutherford-Backscattering (RBS).

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Copyright information

© Springer-Verlag 1987

Authors and Affiliations

  • H. Grübmeier
    • 1
  • E. Gyarmati
    • 1
  • S. Mantl
    • 2
  • M. Mazurkiewicz
    • 1
  • A. Naoumidis
    • 1
  • X. Qui
    • 1
  1. 1.Institut für ReaktorwerkstoffeBundesrepublik Deutschland
  2. 2.Arbeitsgruppe Schichten- und Ionentechnik, Kernforschungsanlage Jülich GmbHJülichBundesrepublik Deutschland

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