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Optical and Quantum Electronics

, Volume 28, Issue 3, pp 267–281 | Cite as

Generation of short-pulse VUV and XUV radiation

  • B. Wellegehausen
  • H. Welling
  • C. Momma
  • M. Feuerhake
  • K. Mossavi
  • H. Eichmann
Laser Sources

Abstract

Starting from intense short-pulse KrF (248 nm, 25 mJ, 400 fs), ArF (193 nm, 10 mJ, ∼1 ps), and Ti:sapphire (810 nm, 100 mJ, 150 fs) laser systems, schemes for the generation of fixed-frequency and tunable VUV and XUV radiation by nonlinear optical techniques are investigated. With the KrF system, a four-wave mixing process in xenon yields tunable radiation in the range of 130–200 nm with output energies of, so far, 100 μJ in less than 1 ps. For the XUV spectral range below 100 nm, nonperturbative high-order harmonic generation and frequency mixing processes in noble gas jets are considered. To achieve tunability, the intense fixed-frequency pump laser radiation is mixed with less intense but broadly tunable radiation from short-pulse dye lasers or optical parametric generator-amplifier systems. In this way, tunability down to wavelengths of less than 40 nm has been demonstrated.

Keywords

Laser Radiation Sapphire Xenon Output Energy Harmonic Generation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Chapman & Hall 1996

Authors and Affiliations

  • B. Wellegehausen
    • 1
  • H. Welling
    • 1
  • C. Momma
    • 1
  • M. Feuerhake
    • 1
  • K. Mossavi
    • 1
  • H. Eichmann
    • 1
  1. 1.Institut für QuantenoptikUniversität HannoverHannoverGermany

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