Advertisement

Applied Physics B

, Volume 49, Issue 4, pp 331–337 | Cite as

Compact, wide aperture X-ray preionized XeCl laser with high specific optical power

  • M. Steyer
  • K. A. Stankov
  • H. Mizoguchi
  • B. Ouyang
  • F. P. Schäfer
Contributed Papers

Abstract

An X-ray preionized, discharge-pumped XeCl laser with a variable beam cross-section of up to 6×6 cm2 is described. It uses flat electrodes and the beam width is determined by X-ray collimation. Its operation characteristics concerning reduced electric field strength (E/p) and X-ray dose are discussed in detail. The inductance of the discharge loop is minimized using a water capacitor arrangement. A very high specific optical power (90 MW/l) is achieved in an active volume of 1.2 l. The pulse energy exceeds 5 J in a 45 ns pulse (FWHM).

PACS

42.55G 42.60B 52.80H 

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    R.S. Taylor, P.B. Corkum, S. Watanabe, K.E. Leopold, A.J. Alcock: IEEE J. QE-19, 416 (1983)Google Scholar
  2. 2.
    M. Steyer, H. Voges: Appl. Phys. B 42, 155 (1987)Google Scholar
  3. 3.
    H.J. Cirkel, W. Bette, D. Friede, R. Müller: Proc. SPIE 735, 50 (1987)Google Scholar
  4. 3a.
    H.-J. Cirkel, W. Bette: German Patent DE2932 781 C2Google Scholar
  5. 4.
    C.R. Tallman, I.J. Bigio: Appl. Phys. Lett. 42, 149 (1983)Google Scholar
  6. 5.
    M. Steyer, B. Ouyang, K.A. Stankov, G. Szábo, H. Mizoguchi, F.P. Schäfer: Proc. SPIE 1023, 75 (1989)Google Scholar
  7. 6.
    R.S. Taylor: Appl. Phys. B 41, 1 (1986)Google Scholar
  8. 7.
    M.R. Osborne, P.W. Smith, M.H.R. Hutchinson: Opt. Commun. 52, 415 (1985)Google Scholar
  9. 8.
    D.E. Rothe, C. Wallace, T. Petach: AIP Conf. Proc. 100 (Excimer Lasers), 33 (1983)Google Scholar
  10. 9.
    H. Hokazono, K. Midorikawa, M. Obara, T. Fujioka: J. Appl. Phys. 56, 680 (1984)Google Scholar
  11. 10.
    G. Stielow, Th. Hammer, W. Bötticher: Appl. Phys. B 47, 333 (1988)Google Scholar
  12. 11.
    M.R. Osborne: J. Appl. Phys. 63, 32 (1988)Google Scholar
  13. 12.
    S. Sumida, K. Kunitomo, M. Kaburagi, M. Obara, T. Fujioka: J. Appl. Phys. 52, 2682 (1981)Google Scholar
  14. 13.
    H. Shields, A.J. Alcock, R.S. Taylor: Appl. Phys. B 31, 27 (1983)Google Scholar
  15. 14.
    D. Lo: Appl. Phys. B 48, 405 (1989)Google Scholar
  16. 15.
    J.I. Levatter, S.-C. Lin: J. Appl. Phys. 51, 210 (1980)Google Scholar
  17. 16.
    A.J. Palmer: Appl. Phys. Lett. 25, 138 (1974)Google Scholar
  18. 17.
    T.J. McKee, D.J. James, W.S. Nip, R.W. Weeks, C. Willis: Appl. Phys. Lett. 36, 943 (1980)Google Scholar
  19. 18.
    A. Atanasov, S.G. Vasilev, I.O. Kovalyov, G.P. Kuz'min, A.A. Nesternko: J. Phys. D 21, 1750 (1988)Google Scholar

Copyright information

© Springer-Verlag 1989

Authors and Affiliations

  • M. Steyer
    • 1
  • K. A. Stankov
    • 1
  • H. Mizoguchi
    • 1
  • B. Ouyang
    • 1
  • F. P. Schäfer
    • 1
  1. 1.Abteilung LaserphysikMax-Planck-Institut für biophysikalische ChemieGöttingenFed. Rep. Germany

Personalised recommendations